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Volumn 60, Issue 2, 2000, Pages 167-179
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Properties of a-SiO:H films prepared by RF glow discharge
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Author keywords
[No Author keywords available]
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Indexed keywords
COMPOSITION EFFECTS;
CRYSTAL DEFECTS;
DEPOSITION;
GLOW DISCHARGES;
HYDROGENATION;
PHOTOCONDUCTIVITY;
PHOTOLYSIS;
PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;
PRESSURE EFFECTS;
SILICA;
THERMAL EFFECTS;
POLYHYDROGENATION;
AMORPHOUS FILMS;
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EID: 0033908852
PISSN: 09270248
EISSN: None
Source Type: Journal
DOI: 10.1016/S0927-0248(99)00081-1 Document Type: Article |
Times cited : (43)
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References (26)
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