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Volumn 60, Issue 2, 2000, Pages 167-179

Properties of a-SiO:H films prepared by RF glow discharge

Author keywords

[No Author keywords available]

Indexed keywords

COMPOSITION EFFECTS; CRYSTAL DEFECTS; DEPOSITION; GLOW DISCHARGES; HYDROGENATION; PHOTOCONDUCTIVITY; PHOTOLYSIS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PRESSURE EFFECTS; SILICA; THERMAL EFFECTS;

EID: 0033908852     PISSN: 09270248     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0927-0248(99)00081-1     Document Type: Article
Times cited : (43)

References (26)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.