The morphology and chemistry evolution of fused silica surface after Ar/CF 4 atmospheric pressure plasma processing

Applied Surface Science

Volumn 286, Issue , 2013, Pages 405-411

  Jin, Huiliang ^a   Xin, Qiang ^a   Li, Na ^a   Jin, Jiang ^a   Wang, Bo ^a   Yao, Yingxue ^a  

^a HARBIN INSTITUTE OF TECHNOLOGY   (China)

Author keywords

Atmospheric pressure plasma; Fused silica; Surface morphology; XPS

Indexed keywords

ATMOSPHERIC CHEMISTRY; ATMOSPHERIC PRESSURE; CHEMICAL ANALYSIS; MORPHOLOGY; PLASMA DEVICES; PLASMA ETCHING; SURFACE MORPHOLOGY; SURFACE TOPOGRAPHY; X RAY PHOTOELECTRON SPECTROSCOPY;

ATMOSPHERIC PRESSURE PLASMAS; CHEMICALLY MODIFIED; FLUOROCARBON RADICALS; PLASMA ETCHING PROCESS; RELATIVE CONCENTRATION; SUB-SURFACE DAMAGE; SURFACE CHARACTERIZATION; THREE-DIMENSIONAL SURFACE;

FUSED SILICA;

EID: 84887434999     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2013.09.100     Document Type: Article

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