A new reactive atom plasma technology (RAPT) for precision machining: The etching of ULE® surfaces

Advanced Engineering Materials

Volumn 8, Issue 10, 2006, Pages 933-939

  Fanara, Carlo ^a   Shore, Paul ^a   Nicholls, John R ^a   Lyford, Nicholas ^b   Kelley, Jude ^b   Carr, Jeff ^b   Sommer, Phil ^b  

^a CRANFIELD UNIVERSITY   (United Kingdom)

^b RAPT Industries Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATMOSPHERIC PRESSURE; ATOMIC PHYSICS; ETCHING; INDUCTIVELY COUPLED PLASMA; PRECISION ENGINEERING;

GAS CONCENTRATION; PRECISION MACHINING; REACTIVE ATOM PLASMA TECHNOLOGY (RAPT);

PLASMA APPLICATIONS;

EID: 33750705922     PISSN: 14381656     EISSN: 15272648     Source Type: Journal    
DOI: 10.1002/adem.200600028     Document Type: Article

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