Nanoscale contact line visualization based on total internal reflection fluorescence microscopy

Optics Express

Volumn 21, Issue 22, 2013, Pages 26093-26102

  Franken, M J Z ^a   Poelma, C ^a   Westerweel, J ^a  

^a DELFT UNIVERSITY OF TECHNOLOGY   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; DROPS; FLUORESCENCE; NANOTECHNOLOGY; REFRACTIVE INDEX; WETTING;

EVANESCENT EXCITATION; EXPONENTIAL BEHAVIORS; INTENSITY DISTRIBUTION; NONCONTACT MEASUREMENTS; OPTICAL CONFIGURATIONS; REFERENCE MEASUREMENTS; TOTAL INTERNAL REFLECTION FLUORESCENCE MICROSCOPY; TOTAL INTERNAL REFLECTIONS;

EVANESCENT FIELDS;

NANOPARTICLE;

ARTICLE; ATOMIC FORCE MICROSCOPY; EQUIPMENT; EQUIPMENT DESIGN; EQUIPMENT FAILURE; FLUORESCENCE MICROSCOPY; MOLECULAR IMAGING; NANOTECHNOLOGY; REPRODUCIBILITY; SENSITIVITY AND SPECIFICITY; ULTRASTRUCTURE;

EQUIPMENT DESIGN; EQUIPMENT FAILURE ANALYSIS; MICROSCOPY, ATOMIC FORCE; MICROSCOPY, FLUORESCENCE; MOLECULAR IMAGING; NANOPARTICLES; NANOTECHNOLOGY; REPRODUCIBILITY OF RESULTS; SENSITIVITY AND SPECIFICITY;

EID: 84887431645     PISSN: None     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OE.21.026093     Document Type: Conference Paper

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