Inorganic/organic multilayer passivation incorporating alternating stacks of organic/inorganic multilayers for long-term air-stable organic light-emitting diodes

Organic Electronics

Volumn 14, Issue 12, 2013, Pages 3385-3391

  Park, Seyeol ^a   Yun, Won Min ^a   Kim, Lae Ho ^a   Park, Seonuk ^a   Kim, Se Hyun ^b   Park, Chan Eon ^a  

^a Pohang University of Science and Technology (POSTECH)   (South Korea)

^b Yeungnam University   (South Korea)

Author keywords

AlOx; Inorganic organic multilayer; lifetimes; long term air stability; OLED passivation

Indexed keywords

ALUMINUM COMPOUNDS; ELECTRONIC EQUIPMENT; HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY; MULTILAYER FILMS; MULTILAYERS; PASSIVATION; SILICON COMPOUNDS; SILICON OXIDES; TRANSMISSION ELECTRON MICROSCOPY;

AIR STABILITY; ALOX; ENVIRONMENTAL AGING; FABRICATION PROCESS; HIGH TRANSMITTANCE; INORGANIC/ORGANIC; LIFETIMES; PENETRATION LENGTH;

ORGANIC LIGHT EMITTING DIODES (OLED);

EID: 84887200629     PISSN: 15661199     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.orgel.2013.09.045     Document Type: Article

References (23)

1. P. Gorrn, M. Sander, J. Meyer, M. Kroger, E. Becker, H. Johannes, W. Kowalsky, and T. Riedle Adv. Mater. 18 2006 738
2. H.K. Chung, H.D. Kim, B. Kristal, SID Int. Smp. Digest Technical Papers 37 (2006) 1447.
3. J.S. Park, H. Chae, H.K. Chung, and S.I. Lee Semicond. Sci. Technol. 26 2011 034001
4. M. Schaer, F. Nuesch, D. Berner, W. Leo, and L. Zuppiroli Adv. Funct. Mater. 11 2001 116
5. H. Zhang, H. You, W. Wang, J. Shi, S. Guo, M. Liu, and D. Ma Semicond. Sci. Technol. 21 2006 1094
6. A. Benor, S. Takizawa, C.P. Bolivar, and P. Anzenbacher Jr. Org. Electron. 11 2010 938
7. Y.R. Do, Y.C. Kim, Y.W. Song, and Y.H. Lee J. Appl. Phys. 96 2004 7629
8. H.K. Kim, M.S. Kim, J.W. Kang, J.J. Kim, and M.S. Yi Appl. Phys. Lett. 90 2007 031502
9. H. Jeon, K. Shin, C. Yang, C.E. Park, and S.H. Park Appl. Phys. Lett. 93 2008 163304
10. J. Meyer, P. Gorrn, F. Bertram, S. Hamwi, T. Winkler, H. Johannes, T. Weimann, P. Hinze, T. Tiedl, and W. Kowalsky Adv. Mater. 2009 1845 21
11. A. Dameron, S. Davidson, B. Burton, P. Carcia, R. McLean, and S.M. George J. Phys. Chem. C 112 2008 4573
12. S. Nam, H. Jeon, S.H. Kim, J. Jang, C. Yang, and C.E. Park Org. Electron. 10 2009 67
13. S. Nam, J. Jang, K. Kim, W.M. Yun, D.S. Chung, J. Hwang, O.K. Kwon, T. Chang, and C.E. Park J. Mater. Chem. 21 2011 775
14. S. Cho, K. Lee, and A.J. Heeger Adv. Mater. 2009 1941 21
15. Y.C. Han, C. Jang, K.J. Kim, K.C. Choi, K.H. Jung, and B.S. Bae Org. Electron. 12 2011 609
16. W.M. Yun, J. Jang, S. Nam, Y.J. Jung, L.H. Kim, S. Park, S.J. Seo, and C.E. Park J. Mater. Chem. 22 2012 25395
17. F.L. Wong, M.K. Fung, S.L. Tao, S.L. Lai, and W.M. Tsang J. Appl. Phys. 104 2008 014509
18. K. Akedo, A. Miura, H. Fujikawa and Y. Taga, R&D Review of Toyota CRDL 40 (2005) 40.
19. G.L. Graff, R.E. Williford, and P.E. Burrows J. Appl. Phys. 2004 1840 96
20. W.M. Yun, J. Jang, S. Nam, L.H. Kim, S.J. Seo, and C.E. Park ACS Appl. Mater. Inter. 4 2012 3247
21. T. Ahn, H.J. Suk, J. Won, and M.H. Yi Microelectron. Eng. 86 2009 41
22. M.D. Groner, S.M. George, R.S. McLean, and P.F. Carcia Appl. Phys. Lett. 88 2006 051907
23. R. Paetzold, A. Winnacker, D. Henseler, V. Cesari, and K. Heuser Rev. Sci. Instrum. 74 2003 5147