Erratum: Structure and electrochemical performance of nitrogen-doped carbon film formed by electron cyclotron resonance sputtering (Anal. Chem. (2013) 85 (9845-9851) DOI: 10.1021/ac402385q);Structure and electrochemical performance of nitrogen-doped carbon film formed by electron cyclotron resonance sputtering

Analytical Chemistry

Volumn 85, Issue 20, 2013, Pages 9845-9851

  Kamata, Tomoyuki ^a   Kato, Dai ^a   Hirono, Shigeru ^b   Niwa, Osamu ^a  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

^b MES Afty Corporation   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS CARBON; AMORPHOUS FILMS; BIOMOLECULES; CARBON FILMS; CHEMICAL BONDS; CYCLOTRONS; DOPING (ADDITIVES); ELECTRON CYCLOTRON RESONANCE; NANOCRYSTALS; NITROGEN;

ELECTROCHEMICAL ACTIVITIES; ELECTROCHEMICAL PERFORMANCE; ELECTRON-CYCLOTRON-RESONANCE SPUTTERING; LINEAR RELATIONSHIPS; NANO-CRYSTALLINE STRUCTURES; NITROGEN CONCENTRATIONS; NITROGEN-DOPED CARBONS; TETRAHEDRAL AMORPHOUS CARBON;

ELECTROCHEMICAL ELECTRODES;

CARBON; HYDROGEN PEROXIDE; NITROGEN; OXYGEN;

ARTICLE; CHEMISTRY; CYCLOTRON; ELECTROCHEMISTRY; ELECTRODE; ELECTRON; OXIDATION REDUCTION REACTION;

CARBON; CYCLOTRONS; ELECTROCHEMISTRY; ELECTRODES; ELECTRONS; HYDROGEN PEROXIDE; NITROGEN; OXIDATION-REDUCTION; OXYGEN;

EID: 84886873402     PISSN: 00032700     EISSN: 15206882     Source Type: Journal    
DOI: 10.1021/ac404138h     Document Type: Erratum

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