SCOPUS 정보 검색 플랫폼

Volumn 547, Issue , 2013, Pages 225-229

Effect of thickness and substrate temperature on the properties of transparent Ti-doped In2O3 films grown by direct current magnetron sputtering

(3) Kim, Dong Ju a Kim, Bong Sueg b Kim, Han Ki a

a Kyung Hee University (South Korea)

b Star Biz Building 105 (South Korea)

Author keywords

Bandgap; DC magnetron sputtering; Resistivity; Ti doped In2O3

Indexed keywords

BURSTEIN-MOSS EFFECTS; DC MAGNETRON SPUTTERING; DIRECT CURRENT MAGNETRON SPUTTERING; GLASS SUBSTRATES; INDIUM TIN OXIDE FILMS; OPTIMIZED CONDITIONS; SUBSTRATE TEMPERATURE; TI-DOPED IN2O3;

DOPING (ADDITIVES); ELECTRIC CONDUCTIVITY; ELECTRIC PROPERTIES; ENERGY GAP; MAGNETRON SPUTTERING; OPTIMIZATION; OXIDE FILMS;

SUBSTRATES;

EID: 84886785374 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/j.tsf.2013.02.073 Document Type: Conference Paper

Times cited : (20)

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