A new endstation at the Swiss Light Source for ultraviolet photoelectron spectroscopy, X-ray photoelectron spectroscopy, and X-ray absorption spectroscopy measurements of liquid solutions

Review of Scientific Instruments

Volumn 84, Issue 7, 2013, Pages

  Brown, Matthew A ^a   Redondo, Amaia Beloqui ^a   Jordan, Inga ^a   Duyckaerts, Nicolas ^a   Lee, Ming Tao ^b   Ammann, Markus ^b   Nolting, Frithjof ^b   Kleibert, Armin ^b   Huthwelker, Thomas ^b   Mächler, Jean Pierre ^a   Birrer, Mario ^b   Honegger, Juri ^b   Wetter, Reto ^b   Wörner, Hans Jakob ^a   Van Bokhoven, Jeroen A ^a,b  

^a ETH ZURICH   (Switzerland)

^b PAUL SCHERRER INSTITUTE   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

AMBIENT PRESSURES; ELECTRON KINETIC ENERGY; ELECTRON SPECTROMETER; EQUILIBRIUM VAPOR; PARTIAL ELECTRON YIELDS; STRUCTURE MEASUREMENT; SWISS LIGHT SOURCES; VAPOR-LIQUID INTERFACES;

CARRIER CONCENTRATION; ELECTRONIC STRUCTURE; JETS; KINETICS; PHASE INTERFACES; PHOTOELECTRONS; ULTRAVIOLET PHOTOELECTRON SPECTROSCOPY; VAPORS; X RAY ABSORPTION SPECTROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY; X RAYS;

LIQUIDS;

EID: 84886739558     PISSN: 00346748     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.4812786     Document Type: Article

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