SCOPUS 정보 검색 플랫폼

Volumn 244, Issue , 2013, Pages 641-645

Characteristics of lithium phosphorous oxynitride thin films deposited by metal-organic chemical vapor deposition technique

(5) Kim, Hong Tak a Mun, Taehong a Park, Chinho a Jin, Sang Wan b Park, Ho Young b

a Yeungnam University (South Korea)

b GS Caltex Corporation (South Korea)

Author keywords

Lithium dipivaloylmethane; Lithium phosphorus oxynitride; Metal organic chemical vapor deposition; Solid electrolyte; Triethyl phosphate

Indexed keywords

ACTIVATION ENERGY; AMORPHOUS FILMS; CHEMICAL ACTIVATION; CHEMICAL VAPOR DEPOSITION; DEPOSITION; DEPOSITION RATES; ELECTROLYTES; FILMS; INDUSTRIAL CHEMICALS; IONIC CONDUCTIVITY; LITHIUM; METALLORGANIC CHEMICAL VAPOR DEPOSITION; NITRIDES; NITROGEN; ORGANIC CHEMICALS; ORGANOMETALLICS; PHOSPHATES; PHOSPHORUS; SOLID ELECTROLYTES; THIN FILMS;

A3. METAL ORGANIC CHEMICAL VAPOR DEPOSITION (MOCVD); ACTIVATION TEMPERATURES; DIPIVALOYLMETHANE; LITHIUM PHOSPHORUS OXYNITRIDE; METAL ORGANIC; OXYGEN CONCENTRATIONS; SUBSTRATE TEMPERATURE; TRIETHYL PHOSPHATES;

VAPOR DEPOSITION;

EID: 84886391573 PISSN: 03787753 EISSN: None Source Type: Journal
DOI: 10.1016/j.jpowsour.2012.12.109 Document Type: Article

Times cited : (52)

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