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Volumn 7, Issue 9, 2004, Pages
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Lithium phosphorus oxynitride thin film fabricated by a nitrogen plasma-assisted deposition of E-beam reaction evaporation
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Author keywords
[No Author keywords available]
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Indexed keywords
CMOS INTEGRATED CIRCUITS;
ELECTRIC IMPEDANCE;
EVAPORATION;
INDUCTIVELY COUPLED PLASMA;
PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;
SPECTROSCOPIC ANALYSIS;
X RAY PHOTOELECTRON SPECTROSCOPY;
ELECTRICAL PROPERTIES;
IMPEDANCE SPECTROSCOPY;
PLASMA-ASSISTED DEPOSITION;
THIN FILMS;
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EID: 5044235419
PISSN: 10990062
EISSN: None
Source Type: Journal
DOI: 10.1149/1.1778934 Document Type: Article |
Times cited : (56)
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References (15)
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