In situ deposition vapor monitoring

In Situ Characterization of Thin Film Growth

Volumn , Issue , 2011, Pages 212-238

  Matias, V ^a   Hammond, R H ^b  

^a LOS ALAMOS NATIONAL LABORATORY   (United States)

^b STANFORD UNIVERSITY   (United States)

Author keywords

Atomic absorption spectroscopy; Deposition rate monitoring; Electron impact emission spectroscopy; Quadrupole mass spectroscopy; Quartz crystal microbalance; Vapor flux monitor

Indexed keywords

EID: 84885481242     PISSN: None     EISSN: None     Source Type: Book    
DOI: 10.1016/B978-1-84569-934-5.50008-4     Document Type: Chapter

References (40)

1. Appelboom H., Matijasevic V., Mathu F., Rietveld G., Anczykowski B., Peterse W., Tuinstra F., Mooij J., Sloof W., Rijken H. Sm-Ba-Cu-O films grown at low temperature and pressure. Physica C Superconductivity 1993, 214:323-334.
2. Benerofe S., Ahn C., Wang M., Kihlstrom K., Do K., Arnason S., Fejer M., Geballe T., Beasley M., Hammond R. Dual beam atomic absorption spectroscopy for controlling thin film deposition rates. Journal of Vacuum Science and Technology - Section B - Microelectronics Nanometer Structure 1994, 12:1217-1220.
3. 7 films by thermal co-evaporation. Journal of Alloys and Compounds 1993, 195:271-274.
4. Bozovic I., Matijasevic V. COMBE: a powerful new tool for materials science. Materials Science Forum 2000, 352:1-8.
5. Buzea C., Robbie K. State of the art in thin film thickness and deposition rate monitoring sensors. Reports on Progress in Physics 2005, 68:385.
6. Campion R., Foxon C., Bresnahan R. Modulated beam mass spectrometer studies of a Mark V Veeco cracker. Journal of Vacuum Science and Technology B 2010, 28. C3F1.
7. Chalmers S., Killeen K. Real-time control of molecular beam epitaxy by optical-based flux monitoring. Applied Physics Letters 1993, 63:3131-3133.
8. Fazekas E., Mezey M., Bunshah R. Application possibilities of atomic resonance-absorption spectroscopy in vacuum metallurgy. Journal of Vacuum Science and Technology 1972, 9:1373-1376.
9. Gogol C., Reagan S. A performance comparison of vacuum deposition monitors employing atomic-absorption (AA) and electron-impact emission spectroscopy (EIES). Journal of Vacuum Science and Technology A 1983, 1:252-256.
10. Hammond R. Electron-beam evaporation synthesis of A15 superconducting compounds - Accomplishments and prospects. IEEE Transactions on Magentics 1975, MAG-11:201-207.
11. Hammond R. Synthesis and physical-properties of superconducting compound films formed by electron-beam codeposition of elements. Journal of Vacuum Science and Technology 1978, 15:382-385.
12. Iwagami N., Shibaki T., Suzuki T., Sekiguchi H., Takegawa N., Morrow W.H. Rocket observations of atomic oxygen density and airglow emission rate in the WAVE2000 campaign. Journal of atmospheric and Solar-Terrestrial Physics 2003, 65:1346-1360.
13. Jaccard Y., Cretton A., Williams E., Locquet J. Characterization of MBE-grown ultrathin films in the LaSrCuO system. Proceedings of SPIE 1994, 2158:200-210.
14. Jackson A., Pinsukanjana P., Gossard A., Coldren L. Noise, drift, and calibration in optical flux monitoring for MBE. Journal of Crystal Growth 1999, 201:17-21.
15. Kieffer L., Dunn G. Electron impact ionization cross-section data for atoms, atomic ions, and diatomic molecules: I. Experimental data. Reviews of Modern Physics 1966, 38:1-35.
16. 2. Physica C: Superconductivity and its applications 1997, 282:107-110.
17. Klausmeier-Brown M., Eckstein J., Bozovic I., Virshup G. Accurate measurement of atomic beam flux by pseudo-double-beam atomic absorption spectroscopy for growth of thin-film oxide superconductors. applied Physics Letters 1992, 60:657-659.
18. Lu C., Guan Y. Improved method of nonintrusive deposition rate monitoring by atomic absorption spectroscopy for physical vapor deposition processes. Journal of Vacuum Science & Technology a: Vacuum, Surfaces, and Films 1995, 13:1797.
19. Lu C., Lewis O. Investigation of film-thickness determination by oscillating quartz resonators with large mass load. Journal of Applied Physics 1972, 43:4385-4390.
20. Lu C., Lightner M., Gogol C. Rate controlling and composition analysis of alloy deposition processes by electron-impact-emission-spectroscopy (EIES). Journal of Vacuum Science and Technology 1977, 14:103-107.
21. Lu C., Missert N., Mooij J., Rosenthal P., Matijsevic V., Beasley M.R., Hammond R.H. Rate and composition control by atomic absorption spectroscopy for the coevaporation of high T superconducting films. AIP Conference Proceedings 1989, 182:163-171.
22. Lu C., Blissett C.D., Diehl G. An electron impact emission spectroscopy flux sensor for monitoring deposition rate at high background gas pressure with improved accuracy. Journal of Vacuum Science and Technology A 2008, 26:956-960.
23. Matijasevic V., Bozovic I. Thin film processes for high-temperature superconductors. Current Opinion in Solid State and Materials Science 1996, 1:47-53.
24. Matijasevic V., Slycke P. Reactive evaporation technology for fabrication of YBCO wafers for microwave applications. Proceedings of SPIE 1998, 3481:190.
25. Matijasevic V., Garwin E., Hammond R. Atomic oxygen detection by a silver- coated quartz deposition monitor. Review of Scientific Instruments 1990, 61:1747-1749.
26. Missert N., Hammond R., Mooij J., Matijasevic V., Rosenthal P., Geballe T., Kapitulnik A., Beasley M., Laderman S., Lu C., Garwin E., Barton R. In situ growth of superconducting YBaCuO using reactive electron-beam coevaporation. IEEE Transactions on Magentics 1989, 25:2418.
27. Sauerbrey G. Verwendung von Schwingquarzen zur Wägung dünner Schichten und zur Mikrowägung. Zeitxhright für Physik 1959, 155:206-222.
28. Schellingerhout A., Janocko M., Klapwijk T., Mooij J. Rate control for electron gun evaporation. Review of Scientific Instruments 1989, 60:1177-1183.
29. Shockley W., Curran D., Koneval D.J. Energy trapping and related studies of multiple electrode filter crystals 1963, 88-126.
30. Smith D. Thin-film Deposition 1995, McGraw-Hill, New York.
31. Stirling A., Westwood W. Investigation of the sputtering of aluminum using atomic-absorption spectroscopy. Journal of applied Physics 1969, 41:742-748.
32. Wajid A. Long-life quartz crystals for dielectric coatings. Surface and Coatings Technology 1993, 62:691-696.
33. Wajid A. Method and a simple apparatus for rapid simultaneous measurement of resonance frequency and Q factor of a quartz crystal. Review of Scientific Instruments 1996, 67:1961-1964.
34. Wajid A. On the accuracy of the quartz-crystal microbalance (QCM) in thin-film depositions. Sensors and actuators a: Physical 1997, 63:41-46.
35. Wang W., Hammond R., Fejer M., Ahn C., Beasley M., Levenson M., Bortz M. Diode-laser-based atomic-absorption monitor using frequency-modulation spectroscopy for physical vapor-deposition process-control. applied Physics Letters 1995, 67:1375-1377.
36. Wang W., Hammond R., Fejer M., Ahn C., Beasley M., Levenson M., Bortz M. Diode-laser-based atomic absorption monitor using frequency-modulation spectroscopy for physical vapor deposition process control. applied Physics Letters 1995, 67:1375.
37. Wang W., Fejer M., Hammond R., Beasley M., Ahn C., Bortz M., Day T. Atomic absorption monitor for deposition process control of aluminum at 394nm using frequency-doubled diode laser. Applied Physics Letters 1996, 68:729-731.
38. Wang W., Hammond R., Fejer M., Arnason S., Beasley M., Bortz M., Day T. Direct atomic flux measurement of electron-beam evaporated yttrium with a diode-laser-based atomic absorption monitor at 668nm. Applied Physics Letters 1997, 71:31-33.
39. Wang W., Hammond R., Fejer M., Beasley M. Atomic flux measurement by diode-laser-based atomic absorption spectroscopy. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 1999, 17:2676.
40. Wessel G. Messung der Oszillatorenstärke der Bariumresonanzlinie. Zeitschrift für Physik 1949, 126:440-449.