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Volumn 26, Issue 4, 2008, Pages 956-960
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An electron impact emission spectroscopy flux sensor for monitoring deposition rate at high background gas pressure with improved accuracy
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Author keywords
[No Author keywords available]
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Indexed keywords
(E ,3E) PROCESS;
ATOMIC EMISSIONS;
ATOMIC SPECIES;
BACKGROUND GASES;
CO-DEPOSITION;
COPPER INDIUM GALLIUM DISELENIDE (CIGS);
ELECTRON IMPACT (EI);
ELECTRON IMPACT EMISSION SPECTROSCOPY (EIES);
ELECTRON IMPACT EXCITATION;
EMISSION LINES;
EMISSION SPECTRUMS;
EMISSIONS (ASPHALT);
EXCITATION SCHEMES;
FILM COMPOSITIONS;
FLUX MEASUREMENTS;
HIGH EFFICIENCY;
INTERFERING SIGNALS;
LOW FLUX;
MOLECULAR SPECIES;
MONITOR (CO);
MONOCHROMATOR;
MULTI COMPONENTS;
OPTICAL (PET) (OPET);
OPTICAL EMISSIONS;
OPTICAL OUTPUT;
OUTPUT SIGNALS;
PHOTOVOLTAIC (PV);
REACTIVE DEPOSITION;
RESIDUAL GASES;
SENSOR PERFORMANCES;
SIGNAL PROCESSING TECHNIQUE;
THIN-FILM MATERIALS;
VAPOR FLUXES;
WAVELENGTH SELECTION;
AIR POLLUTION;
ATOMIC PHYSICS;
ATOMIC SPECTROSCOPY;
ATOMS;
CONTROL THEORY;
COPPER;
DENSITY OF GASES;
DETECTORS;
ELECTRIC EXCITATION;
ELECTROMAGNETIC WAVE EMISSION;
ELECTRONS;
EMISSION CONTROL;
GALLIUM;
GASES;
INDIUM;
INTEGRATED OPTOELECTRONICS;
LEAKAGE (FLUID);
LIGHT SOURCES;
MILITARY DATA PROCESSING;
MOLECULAR SPECTROSCOPY;
MONITORING;
OPTICAL DESIGN;
PRESSURE;
PROCESS CONTROL;
PRODUCTION CONTROL;
SCALE (DEPOSITS);
SELENIUM COMPOUNDS;
SENSORS;
SIGNAL PROCESSING;
SOLAR POWER GENERATION;
SPECTRUM ANALYSIS;
STRUCTURE (COMPOSITION);
THICK FILMS;
VAPOR DEPOSITION;
VAPORS;
EMISSION SPECTROSCOPY;
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EID: 46449129024
PISSN: 07342101
EISSN: None
Source Type: Journal
DOI: 10.1116/1.2830633 Document Type: Article |
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Times cited : (14)
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References (4)
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