Multi-source MBE with high-precision rate control system as a synthesis method sui generis for multi-cation metal oxides

Journal of Crystal Growth

Volumn 378, Issue , 2013, Pages 184-188

  Yamamoto, Hideki ^a   Krockenberger, Yoshiharu ^a   Naito, Michio ^a,b  

^a NTT Basic Research Laboratories   (Japan)

^b TOKYO UNIVERSITY OF AGRICULTURE AND TECHNOLOGY   (Japan)

Author keywords

High precision rate control system; Multi cation metal oxides; Oxide MBE

Indexed keywords

CONTROL SYSTEMS; COPPER OXIDES; EPITAXIAL GROWTH; MOLECULAR BEAM EPITAXY; OXIDE FILMS; POSITIVE IONS; TEMPERATURE;

CONSTITUENT ELEMENTS; HIGH-PRECISION; LOW TEMPERATURE REACTIONS; METAL OXIDES; METALLIC CONDUCTION; SINGLE-CRYSTALLINE; STABILIZATION EFFECTS; SYNTHESIS METHOD;

CONTROL SYSTEM SYNTHESIS;

EID: 84885479288     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcrysgro.2012.12.057     Document Type: Article

References (27)

1. M. Naito, H. Sato, H. Yamamoto, Physica C 293 (1997) 36.
2. J. Kurian, M. Naito, IEEE Transactions on Applied Superconductivity 15 (2005) 2966.
3. M. Naito, H. Yamamoto, H. Sato, Physica C 305 (1998) 233.
4. I. Božović, A. Gozar, G. Logvenov, A. Bollinger, N. Božović, Z. Radović, Journal of Superconductivity and Novel Magnetism 22 (2009) 223.
5. W. Siemons, G. Koster, A. Vailionis, H. Yamamoto, D.H.A. Blank, M.R. Beasley, Physical Review B 76 (2007) 075126.
6. C.M. Brooks, L.F. Kourkoutis, T. Heeg, J. Schubert, D.A. Muller, D.G. Schlom, Applied Physics Letters 94 (2009) 162905.
7. A. Buckow, R. Retzlaff, J. Kurian, L. Alff, Physics Procedia 27 (2012) 300.
8. K.Y. Lee, W.C. Lee, Y.J. Lee, M.L. Huang, C.H. Chang, T.B. Wu, M. Hong, J. Kwo, Applied Physics Letters 89 (2006) 222906.
9. J. Falson, D. Maryenko, Y. Kozuka, A. Tsukazaki, M. Kawasaki, Applied Physics Express 4 (2011) 091101.
10. M. Higashiwaki, K. Sasaki, A. Kuramata, T. Masui, S. Yamakoshi, Applied Physics Letters 100 (2012) 013504.
11. Y Tokura, H.Y. Hwang, Nature Materials 7 (2008) 694.
12. W.A. Doolittle, A.G. Carver, W. Henderson, Journal of Vacuum Science and Technology B23 (2005) 1272.
13. V. Matias, R.H. Hammond, In situ Characterization of Thin Film Growth, in: G. Koster, G. Rijnders (Eds.), Woodhead Publishing Ltd., Cambridge, 2011, pp. 212-238.
14. R. Iscoff, Semiconductor International 8 (1994) 69.
15. C. Lu, Y. Guan, Journal of Vacuum Science and Technology A13 (1995) 1797.
16. W. Wang, R.H. Hammond, M.M. Fejer, C.H. Ahn, M.R. Beasley, M.D. Levenson, M.L. Bortz, Applied Physics Letters 67 (1995) 1375.
17. M. Naito, R.H. Hammond, B. Oh, M.R. Hahn, J.W.P. Hsu, P. Rosenthal, A.F. Marshall, M.R. Beasley, T.H. Geballe, A. Kapitulnik, Journal of Materials Research 2 (1987) 713.
18. C. Lu, C.D. Blissett, G. Diehl, Journal of Vacuum Science and Technology A26 (2008) 956.
19. Y. Krockenberger, K. Sakuma, H. Yamamoto, Applied Physics Express 5 (2012) 043101.
20. S. Karimoto, K. Ueda, M. Naito, Applied Physics Letters 79 (2001) 2767.
21. S. Karimoto, K. Ueda, M. Naito, T. Imai, Physica C 378-381 (2002) 127.
22. M. Naito, H. Sato, H. Yamamoto, Proceedings of SPIE 3481 (1998) 214.
23. J. Tomaschko, V. Leca, T. Selistrovski, S. Diebold, J. Jochum, R. Kleiner, D. Koelle, Physical Review B 85 (2012) 024519.
24. A. Tsukada, T. Greibe, M. Naito, Physical Review B 66 (2002) 184515.
25. H. Yamamoto, O. Matsumoto, A. Tsukada, M. Naito, Physica C 470 (2010) 1025.
26. Z. Fisk, S.W. Cheong, J.D. Thompson, M.F. Hundley, R.B. Schwarz, G.H. Kwei, Physica C 162-164 (1989) 1681.
27. F. Tsui, L. He, Review of Scientific Instruments 76 (2005) 062206.