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Journal of Applied Physics

Volumn 114, Issue 13, 2013, Pages

Heavily doped silicon and nickel silicide nanocrystal composite films with enhanced thermoelectric efficiency

(6) Uchida, Noriyuki a Tada, Tetsuya a Ohishi, Yuji b Miyazaki, Yoshinobu b Kurosaki, Ken b Yamanaka, Shinsuke b

a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST (Japan)

b OSAKA UNIVERSITY (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

NANOCRYSTALS; NICKEL; NICKEL COMPOUNDS; PHOSPHORUS; SEMICONDUCTOR DOPING; SILICIDES; SILICON; THERMAL CONDUCTIVITY; THERMOELECTRICITY;

FIGURES OF MERITS; HEAVILY DOPED SILICONS; HIGH ELECTRICAL CONDUCTIVITY; LOW THERMAL CONDUCTIVITY; NANOSTRUCTURED BULK; THERMAL-ANNEALING; THERMO-ELECTRIC MATERIALS; THERMOELECTRIC EFFICIENCY;

NANOCOMPOSITE FILMS;

EID: 84885445330 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.4823814 Document Type: Article

Times cited : (37)

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