Introducing carbon diffusion barriers for uniform, high-quality graphene growth from solid sources

Nano Letters

Volumn 13, Issue 10, 2013, Pages 4624-4631

  Weatherup, Robert S ^a   Baehtz, Carsten ^b   Dlubak, Bruno ^a   Bayer, Bernhard C ^a   Kidambi, Piran R ^a   Blume, Raoul ^c   Schloegl, Robert ^d   Hofmann, Stephan ^a  

^a UNIVERSITY OF CAMBRIDGE   (United Kingdom)

^b INSTITUTE OF ION BEAM PHYSICS AND MATERIALS RESEARCH   (Germany)

^c HAHN MEITNER INSTITUT   (Germany)

^d FRITZ HABER INSTITUT DER MAX PLANCK GESELLSCHAFT   (Germany)

Author keywords

diffusion barrier; Graphene; in situ; low temperature; solid carbon; XPS; XRD

Indexed keywords

ALUMINA; ALUMINUM OXIDE; GRAPHENE; NICKEL COMPOUNDS; TEMPERATURE; X RAY PHOTOELECTRON SPECTROSCOPY;

CARBON DISSOLUTION; CATALYTIC TRANSFORMATION; IN-SITU MEASUREMENT; LAYERED MATERIAL; LOW TEMPERATURES; SOLID CARBON; SOLID CARBON SOURCES; SOLID STATE GROWTH;

DIFFUSION BARRIERS;

ALUMINUM OXIDE; CARBON; GRAPHITE; NANOMATERIAL; NICKEL;

CATALYSIS; CHEMISTRY; CRYSTALLIZATION; DIFFUSION; RAMAN SPECTROMETRY; SURFACE PROPERTY;

ALUMINUM OXIDE; CARBON; CATALYSIS; CRYSTALLIZATION; DIFFUSION; GRAPHITE; NANOSTRUCTURES; NICKEL; SPECTRUM ANALYSIS, RAMAN; SURFACE PROPERTIES;

MLCS; MLOWN;

EID: 84885436278     PISSN: 15306984     EISSN: 15306992     Source Type: Journal    
DOI: 10.1021/nl401601x     Document Type: Article

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