Optical constants and dispersion energy parameters of NiO thin films prepared by radio frequency magnetron sputtering technique

Journal of Applied Physics

Volumn 114, Issue 12, 2013, Pages

  Usha, K S ^a   Sivakumar, R ^a   Sanjeeviraja, C ^b  

^a ALAGAPPA UNIVERSITY   (India)

^b ALAGAPPA CHETTIAR COLLEGE OF ENGINEERING AND TECHNOLOGY   (India)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTALLINITY; DISPERSION (WAVES); ENERGY GAP; MAGNETRON SPUTTERING; NICKEL OXIDE; OXIDE FILMS; REFRACTIVE INDEX; SUBSTRATES;

ANOMALOUS DISPERSION; DISPERSION PARAMETERS; OPTICAL ENERGY BAND GAP; POSSIBLE MECHANISMS; RADIO FREQUENCY MAGNETRON SPUTTERING; RF MAGNETRON SPUTTERING TECHNIQUE; STRUCTURAL AND OPTICAL PROPERTIES; WEMPLE-DIDOMENICO MODEL;

THIN FILMS;

EID: 84885398873     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.4821966     Document Type: Article

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