Preparation and characterization of nanostructured NiO thin films by reactive-pulsed laser ablation technique

Solar Energy Materials and Solar Cells

Volumn 91, Issue 15-16, 2007, Pages 1505-1509

  Sasi, B ^a   Gopchandran, K G ^a  

^a UNIVERSITY OF KERALA   (India)

Author keywords

Laser ablation; Nanostructured; NiO films; Oxidation

Indexed keywords

NANOSTRUCTURED NICKEL OXIDE (NIO) THIN FILMS; NIO FILMS; SUBSTRATE TEMPERATURE;

LASER ABLATION; NANOSTRUCTURED MATERIALS; NICKEL OXIDE; PULSED LASER APPLICATIONS; X RAY DIFFRACTION ANALYSIS;

THIN FILMS;

EID: 34447288752     PISSN: 09270248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.solmat.2007.04.019     Document Type: Article

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