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Materials Research Bulletin

Volumn 49, Issue 1, 2014, Pages 66-70

Effects of oxygen on growth of carbon nanotubes prospered by PECVD

(4) Qi, J L a,b Zhang, L X a Cao, J a Feng, J C a

a HARBIN INSTITUTE OF TECHNOLOGY (China)

b UNIVERSITY OF TOKYO (Japan)

Author keywords

Nanostructures; Plasma deposition; Surface properties; TEM

Indexed keywords

ALIGNED CNTS; ETCHING EFFECT; FUNCTIONALIZATIONS; GROWTH PROCESS; HIGH QUALITY; OH RADICAL; OXYGEN GAS;

CARBON NANOTUBES; CATALYST ACTIVITY; NANOSTRUCTURES; OXYGEN; PLASMA DEPOSITION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SURFACE PROPERTIES; TRANSMISSION ELECTRON MICROSCOPY;

FREE RADICALS;

EID: 84884582401 PISSN: 00255408 EISSN: None Source Type: Journal
DOI: 10.1016/j.materresbull.2013.08.027 Document Type: Article

Times cited : (12)

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