SCOPUS 정보 검색 플랫폼

Volumn 330-332, Issue , 2002, Pages 569-573

Hydrogen plasma treatment on catalytic layer and effect of oxygen additions on plasma enhanced chemical vapor deposition of carbon nanotube

(4) Lee, Ho a Kang, Youn Seon a Lee, Paul S a Lee, Jai Young a

a Korea Advanced Institute of Science and Technology (KAIST) (South Korea)

Author keywords

Carbon nanotubes; Chemical vapor deposition; Hydrogen plasma treatment; Optical emission spectroscopy; Oxygen additions

Indexed keywords

OPTICAL EMISSION SPECTROSCOPY (OES); PLASMA TREATMENT;

ADDITION REACTIONS; ETCHING; OXYGEN; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SUBSTRATES; SYNTHESIS (CHEMICAL); THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY;

CARBON NANOTUBES;

EID: 0037122503 PISSN: 09258388 EISSN: None Source Type: Journal
DOI: 10.1016/S0925-8388(01)01599-7 Document Type: Conference Paper

Times cited : (25)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.