Growth of millimeter-scale vertically aligned carbon nanotubes by microwave plasma chemical vapor deposition

Japanese Journal of Applied Physics

Volumn 49, Issue 8 PART 1, 2010, Pages

  Kim, Yooseok ^a   Song, Wooseok ^a   Lee, Seung Youb ^a   Shrestha, Sabita ^a   Jeon, Cheolho ^a   Choi, Won Chel ^a   Kim, Minkook ^a   Park, Chong Yun ^a  

^a Sungkyunkwan University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

BAND RATIOS; CRYSTALLINITIES; HIGH GROWTH RATE; LOW TEMPERATURES; MICROWAVE PLASMA CHEMICAL VAPOR DEPOSITIONS; RAMAN SPECTRA; VERTICALLY ALIGNED CARBON NANOTUBE;

CARBON NANOTUBES; CHEMICAL VAPOR DEPOSITION; DOSIMETRY; GROWTH RATE; MICROWAVES; OXYGEN; RAMAN SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; TRANSMISSION ELECTRON MICROSCOPY;

PLASMA DEPOSITION;

EID: 77957869623     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.49.085101     Document Type: Article

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