Anisotropic wrinkle formation on shape memory polymer substrates

Journal of Applied Physics

Volumn 112, Issue 12, 2012, Pages

  Chen, Zhongbi ^a   Young Kim, Yun ^a,b   Krishnaswamy, Sridhar ^a  

^a Northwestern University   (United States)

^b SAMSUNG Electronics   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

FILM THICKNESS; SELF ASSEMBLY; SHAPE OPTIMIZATION; SHAPE-MEMORY POLYMER; STRAIN; THERMAL EXPANSION; THIN FILMS;

BI-LAYER STRUCTURE; COMPRESSION TENSIONS; FINITE DEFORMATIONS; ORGANIC PHOTOVOLTAICS; POSITIVE COEFFICIENTS; PROGRESSIVE DAMAGE; SELF-ASSEMBLY FABRICATION; UNIDIRECTIONAL PATTERNS;

SUBSTRATES;

EID: 84884536008     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.4770483     Document Type: Article

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