Biorecognition by DNA oligonucleotides after exposure to photoresists and resist removers

Langmuir

Volumn 29, Issue 36, 2013, Pages 11535-11545

  Dean, Stacey L ^a   Morrow, Thomas J ^a   Patrick, Susan ^b   Li, Mingwei ^c   Clawson, Gary A ^b   Mayer, Theresa S ^a,c   Keating, Christine D ^a  

^a PENNSYLVANIA STATE UNIVERSITY   (United States)

^b PENN STATE CANCER INSTITUTE   (United States)

^c The Pennsylvania State University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPLEMENTARY STRAND; DNA OLIGONUCLEOTIDES; FLUORESCENCE IMAGING; INTEGRATED CIRCUIT TECHNOLOGY; LITHOGRAPHIC MICROFABRICATION; PHOTOLITHOGRAPHIC PROCESS; SILICON TECHNOLOGIES; SINGLE-BASE MISMATCH;

ACETONE; ADSORPTION; DNA; DNA SEQUENCES; GOLD COATINGS; NANOWIRES; OLIGONUCLEOTIDES; PHOTORESISTS;

BIOMOLECULES;

ACETONE; DNA; NANOMATERIAL; OLIGODEOXYRIBONUCLEOTIDE; ORGANIC COMPOUND; SILICON DIOXIDE;

ARTICLE; BASE MISPAIRING; CHEMISTRY; EQUIPMENT; GENETIC PROCEDURES; GENETICS; LIGHT; NANOTECHNOLOGY; NUCLEIC ACID HYBRIDIZATION; NUCLEOTIDE SEQUENCE;

ACETONE; BASE PAIR MISMATCH; BASE SEQUENCE; BIOSENSING TECHNIQUES; DNA; LIGHT; NANOSTRUCTURES; NANOTECHNOLOGY; NUCLEIC ACID HYBRIDIZATION; OLIGODEOXYRIBONUCLEOTIDES; ORGANIC CHEMICALS; SILICON DIOXIDE;

EID: 84884186921     PISSN: 07437463     EISSN: 15205827     Source Type: Journal    
DOI: 10.1021/la402362u     Document Type: Article

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