Surface analysis of photolithographic patterns using ToF-SIMS and PCA

Surface and Interface Analysis

Volumn 41, Issue 8, 2009, Pages 645-652

  Dubey, Manish ^a,b   Emoto, Kazunori ^d,e   Cheng, Fang ^a,b   Gamble, Lara J ^a,d   Takahashi, Hironobu ^f   Grainger, David W ^f,g   Castner, David G ^a,b,c  

^a UNIVERSITY OF WASHINGTON   (United States)

^b University of Washington   (United States)

^c University of Washington   (United States)

^d Accelr8 Technology Corporation   (United States)

^e Great Basin Scientific   (United States)

^f UNIVERSITY OF UTAH   (United States)

^g Department of Electrical and Computer Engineering   (United States)

Author keywords

Pattern; Photolithography; Photoresist; Principal component analysis; Surface analysis; ToF SIMS

Indexed keywords

CELL-BASED BIOSENSOR; CHARACTERIZATION TECHNIQUES; DATA ANALYSIS METHODS; HIGH RESOLUTION; HIGH SENSITIVITY; IMAGING TOF-SIMS; MULTIVARIATE ANALYSIS METHODS; N-HYDROXYSUCCINIMIDE; PATTERN; PATTERNED SURFACE; PHOTORESIST MATERIALS; POLYMER COATING; REACTIVE SURFACES; RESIDUE ANALYSIS; SPATIAL MAPPING; STANDARD PHOTOLITHOGRAPHY; SURFACE QUALITY CONTROL; SURFACE REACTIVITY; SURFACE SPECIES; TIME OF FLIGHT SECONDARY ION MASS SPECTROMETRY; TOF-SIMS; TWO-COMPONENT;

BIOSENSORS; CELL MEMBRANES; DECISION MAKING; ION SOURCES; IONS; MULTIVARIANT ANALYSIS; PHOTORESISTORS; PHOTORESISTS; PLASTIC COATINGS; PRINCIPAL COMPONENT ANALYSIS; QUALITY ASSURANCE; QUALITY CONTROL; QUALITY FUNCTION DEPLOYMENT; SECONDARY ION MASS SPECTROMETRY; SURFACE CHEMISTRY; SURFACE TREATMENT; THREE DIMENSIONAL; TOTAL QUALITY MANAGEMENT; TWO DIMENSIONAL;

SURFACE ANALYSIS;

EID: 68349158038     PISSN: 01422421     EISSN: 10969918     Source Type: Journal    
DOI: 10.1002/sia.3056     Document Type: Article

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