Atomic layer lithography of wafer-scale nanogap arrays for extreme confinement of electromagnetic waves

Nature Communications

Volumn 4, Issue , 2013, Pages

  Chen, Xiaoshu ^a   Park, Hyeong Ryeol ^b   Pelton, Matthew ^c   Piao, Xianji ^b   Lindquist, Nathan C ^a   Im, Hyungsoon ^a   Kim, Yun Jung ^b   Ahn, Jae Sung ^b   Ahn, Kwang Jun ^b   Park, Namkyoo ^b   Kim, Dai Sik ^b   Oh, Sang Hyun ^a  

^a University of Minnesota   (United States)

^b Seoul National University   (South Korea)

^c ARGONNE NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ADHESIVE AGENT; GOLD; SILVER;

ELECTROMAGNETIC WAVE; ELECTRONIC EQUIPMENT; FILM; METAL; NANOTECHNOLOGY; REFRACTIVE INDEX; SEMICONDUCTOR INDUSTRY; SUBSTRATE; WAVE PROPAGATION;

ARTICLE; ATOMIC LAYER LITHOGRAPHY; CHEMICAL REACTION; ELECTROMAGNETIC FIELD; ELECTROMAGNETIC RADIATION; INFRARED RADIATION; LIGHT; PARTICLE SIZE; PRINTING; TECHNOLOGY; TERAHERTZ SPECTROSCOPY;

EID: 84884171914     PISSN: None     EISSN: 20411723     Source Type: Journal    
DOI: 10.1038/ncomms3361     Document Type: Article

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