Nanocolumnar interfaces and enhanced magnetic coercivity in preferentially oriented cobalt ferrite thin films grown using oblique-angle pulsed laser deposition

ACS Applied Materials and Interfaces

Volumn 5, Issue 15, 2013, Pages 7450-7457

  Mukherjee, Devajyoti ^a   Hordagoda, Mahesh ^a   Hyde, Robert ^a   Bingham, Nicholas ^a   Srikanth, Hariharan ^a   Witanachchi, Sarath ^a   Mukherjee, Pritish ^a  

^a UNIVERSITY OF SOUTH FLORIDA   (United States)

Author keywords

glancing angle deposition; magneto optic recording; nanostructured thin films; remnant magnetization; strain

Indexed keywords

CRYSTALLOGRAPHIC PLANE; FILM-SUBSTRATE INTERFACES; GLANCING ANGLE DEPOSITION; HIGH-RESOLUTION TRANSMISSION ELECTRON MICROSCOPES; MAGNETIC COERCIVITIES; MAGNETO-OPTIC RECORDING; NANOSTRUCTURED THIN FILM; REMNANT MAGNETIZATION;

COERCIVE FORCE; CRYSTAL ORIENTATION; DEPOSITION; FILM GROWTH; PULSED LASER DEPOSITION; STRAIN; SUBSTRATES; THIN FILMS; X RAY DIFFRACTION;

INTERFACES (MATERIALS);

EID: 84882779353     PISSN: 19448244     EISSN: 19448252     Source Type: Journal    
DOI: 10.1021/am401771z     Document Type: Article

References (54)

1. Bozorth, R. M. Ferromagnetism, 6 th ed.; D. Van Nostrand Company: New York, 1961.
2. Goldman, A. Modern Ferrite Technology, 2 nd ed.; Springer: New York, 2006.
3. Dorsey, P. C.; Lubitz, P.; Chrisey, D. B.; Horwitz, J. S. J. Appl. Phys. 1996, 79, 6338-6340
4. Chapline, M.; Wang, S. Phys. Rev. B 2006, 74, 014418
5. Caltun, O. F.; Rao, G. S. N.; Rao, K. H.; Rao, B. P.; Kim, C.; Kim, C.-O.; Dumitru, I.; Lupu, N.; Chiriac, H. Sensor Lett. 2007, 5, 45-47
6. Rendale, M. K.; Kulkarni, S. D.; Puri, V. Microelectron. Int. 2009, 26, 43-46
7. Mukherjee, D.; Dhakal, T.; Phan, M. H.; Srikanth, H.; Mukherjee, P.; Witanachchi, S. Physica. B. Condens. Matter. 2011, 406, 2663-2668
8. Dhakal, T.; Mukherjee, D.; Hyde, R.; Mukherjee, P.; Phan, M. H.; Srikanth, H.; Witanachchi, S. J. Appl. Phys. 2010, 107, 053914
9. Huang, W.; Zhu, J.; Zeng, H. Z.; Wei, X. H.; Zhang, Y.; Li, Y. R. Appl. Phys. Lett. 2006, 89, 262506
10. Terzzoli, M. C.; Duhalde, S.; Jacobo, S.; Steren, L.; Moina, C. J. Alloys Compd. 2004, 369, 209-212
11. Hiratsuka, N.; Nozawa, M.; Kakizaki, K. J. Magn. Soc. Jpn. 1996, 20, 53-56
12. Okuno, S. N.; Hashimoto, S.; Inomata, K. J. Appl. Phys. 1992, 71, 5926-5929
13. Pramanik, N. C.; Fujii, T.; Nakanishi, M.; Takada, J. Mater. Lett. 2005, 59, 88-93
14. Lee, J. G.; Park, J. Y.; Oh, Y. J.; Kim, C. S. J. Appl. Phys. 1998, 84, 2801-2804
15. Raghunathan, A.; Nlebedim, I. C.; Jiles, D. C.; Snyder, J. E. J. Appl. Phys. 2010, 107, 09A516
16. Araújo, C.; Almeida, B. G.; Aguiar, M.; Mendes, J. A. Vacuum 2008, 82, 1437-1440
17. Gao, X. S.; Bao, D. H.; Birajdar, B.; Habisreuther, T.; Mattheis, R.; Schubert, M. A.; Alexe, M.; Hesse, D. J. Phys. D: Appl. Phys. 2009, 42, 175006
18. Ning, M.; Li, J.; Ong, C. K.; Wang, S. J. J. Appl. Phys. 2008, 103, 013911
19. Thang, P. D.; Rijnders, G.; Blank, D. H. A. J. Magn. Magn. Mater. 2007, 310, 2621-2623
20. Mukherjee, D.; Dhakal, T.; Hyde, R.; Mukherjee, P.; Srikanth, H.; Witanachchi, S. J. Phys. D: Appl. Phys. 2010, 43, 485001
21. Wang, X. W.; Zhang, Y. Q.; Meng, H.; Wang, Z. J.; Zhang, Z. D. J. Alloys Compd. 2011, 509, 7803-7807
22. Wang, Y. C.; Ding, J.; Yi, J. B.; Liu, B. H.; Yu, T.; Shen, Z. X. Appl. Phys. Lett. 2004, 84, 2596-2598
23. Robbie, K.; Beydaghyan, G.; Brown, T.; Dean, C.; Adams, J.; Buzea, C. Rev. Sci. Instrum. 2004, 75, 1089-1097
24. Robbie, K.; Brett, M. J. J. Vac. Sci. Technol. A. 1997, 15, 1460-1465
25. Karabacak, T.; Mallikarjunan, A.; Singh, J. P.; Ye, D.; Wang, G. C.; Lu, T. M. Appl. Phys. Lett. 2003, 83, 3096-3098
26. Shim, Y.; Amar, J. G. Phys. Rev. Lett. 2007, 98, 046103
27. Ye, D. X.; Zhao, Y. P.; Yang, G. R.; Zhao, Y. G.; Wang, G. C.; Lu, T. M. Nanotechnology 2002, 13, 615-618
28. Ma, Y.; Liu, F.; Zhu, M.; Liu, J.; Wang, H.; Yang, Y.; Li, Y. Nanotechnology 2009, 20, 275201
29. Drotar, J.; Zhao, Y.-P.; Lu, T.-M.; Wang, G. C. Phys. Rev. B 2000, 62, 2118-2125
30. Shim, Y.; Borovikov, V.; Amar, J. G. Phys. Rev. B 2008, 77, 235423
31. Mayr, S. G.; Samwer, K. J. Appl. Phys. 2002, 91, 2779-2784
32. Wang, H.; Zhao, Y. P. J. Vac. Sci. Technol. B. Microelectron. Nanometer. Struct. Process. Meas. Phenom. 2006, 24, 1230-1233
33. Chen, A.; Bi, Z.; Tsai, C. F.; Chen, L.; Su, Q.; Zhang, X.; Wang, H. Cryst. Growth. Des. 2011, 11, 5405-5409
34. Witanachchi, S.; Mukherjee, P. J. Appl. Phys. 1995, 78, 4099-4103
35. Schey, B.; Biegel, W.; Kuhn, M.; Stritzker, B. Appl. Phys. A-Mater. 1999, 69, S419-S422
36. Mukherjee, P.; Chen, S.; Witanachchi, S. Appl. Phys. Lett. 1999, 74, 1546-1548
37. 30 Type-I Clathrate Thin-Films Deposited by Pulsed Dual-Laser Ablation. Ph.D. Dissertation, University of South Florida, Tampa, FL, 2011.
38. Mukherjee, D.; Hyde, R.; Mukherjee, P.; Srikanth, H.; Witanachchi, S. J. Appl. Phys. 2012, 111, 089905
39. Mukherjee, D.; Hyde, R.; Hordagoda, M.; Bingham, N.; Srikanth, H.; Witanachchi, S.; Mukherjee, P. J. Appl. Phys. 2012, 112, 064101
40. Geohegan, D. B. In Pulsed Laser Deposition of Thin Films; Chrisey, D. B.; Hubler, G. K., Eds.; Wiley: New York, 1994; pp 115-165.
41. Hirata, T.; Miyazaki, Z. Anal. Chem. 2007, 79, 147-52
42. Kranenburg, H.; van Lodder, C. Mater. Sci. Eng. R. Rep. 1994, 11, 295-354
43. Yin, J. H.; Ding, J.; Liu, B. H.; Miao, X. S.; Chen, J. S. J. Magn. Magn. Mater. 2007, 310, 2537-2539
44. Cullity, B. D. Elements of X-Ray Diffraction, 2 nd ed.; Addison-Wesley: New York, 1978.
45. Klug, H. P.; Alexander, L. E. X-Ray Diffraction Procedures: For Polycrystalline and Amorphous Materials, 2 nd ed.; Wiley-Interscience: New York, 1974.
46. Williamson, G. K.; Hall, W. H. Acta. Metall. 1953, 1, 22-31
47. Chinnasamy, C. N.; Jeyadevan, B.; Shinoda, K.; Tohji, K.; Djayaprawira, D. J.; Takahashi, M.; Joseyphus, R. J.; Narayanasamy, A. Appl. Phys. Lett. 2003, 83, 2862-2864
48. Janssen, G. C. A. M. Thin Solid Films 2007, 515, 6654-6664
49. Zhao, Y.-P.; Ye, D.-X.; Wang, G.-C.; Lu, T.-M. Nano Lett. 2002, 2, 351-354
50. Vick, D.; Smy, T.; Brett, M. J. J. Mater. Res. 2011, 17, 2904-2911
51. Huang, W.; Zhou, L. X.; Zeng, H. Z.; Wei, X. H.; Zhu, J.; Zhang, Y.; Li, Y. R. J. Cryst. Growth 2007, 300, 426-430
52. Ohring, M. Materials Science of Thin Films, 2 nd ed.; Academic Press: New York, 2001.
53. Ding, J.; Chen, Y. J.; Shi, Y.; Wang, S. Appl. Phys. Lett. 2000, 77, 3621
54. Lisfi, A.; Williams, C. M. J. Appl. Phys. 2003, 93, 8143-8145