Microwave dielectric and attenuation properties of Ni 0.7-xCoxZn0.3Fe2O4 thick films

Microelectronics International

Volumn 26, Issue 1, 2009, Pages 43-46

  Rendale, M K ^a   Kulkarni, S D ^b   Puri, Vijaya ^c  

^a Hirasugar Institute of Technology   (India)

^b NATIONAL CHEMICAL LABORATORY   (India)

^c SHIVAJI UNIVERSITY   (India)

Author keywords

Microwaves; Oxides; Thick film circuits

Indexed keywords

EID: 58449096244     PISSN: 13565362     EISSN: None     Source Type: Journal    
DOI: 10.1108/13565360910923160     Document Type: Article

References (11)