High-coercivity Co-ferrite thin films on (100)-SiO 2 substrate

Applied Physics Letters

Volumn 84, Issue 14, 2004, Pages 2596-2598

  Wang, Y C ^a   Ding, J ^a   Yi, J B ^a   Liu, B H ^a   Yu, T ^a   Shen, Z X ^a  

^a NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING TEMPERATURES; DEPOSITION RATES; LATTICE STRAIN; RAMAN SHIFTS;

ANNEALING; ATOMIC FORCE MICROSCOPY; COERCIVE FORCE; DIFFUSION; MAGNETIC ANISOTROPY; MAGNETIZATION; MICROELECTROMECHANICAL DEVICES; NANOSTRUCTURED MATERIALS; SILICA; SINGLE CRYSTALS; X RAY DIFFRACTION ANALYSIS;

THIN FILMS;

EID: 2342578715     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1695438     Document Type: Article

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