Evaluation of the factors that influence the fabrication of porous thin films by deposition of aerosol nanoparticles

Chemical Engineering Journal

Volumn 232, Issue , 2013, Pages 221-227

  Kubo, Masaru ^a   Ishihara, Yu ^a   Mantani, Yuki ^a   Shimada, Manabu ^a  

^a HIROSHIMA UNIVERSITY   (Japan)

Author keywords

Aerosol nanoparticles; Electrostatic deposition; Nanostructure; Plasma synthesis; Porous thin film

Indexed keywords

AEROSOL NANOPARTICLE; AGGLOMERATED NANOPARTICLES; ELECTROSTATIC DEPOSITION; METAL OXIDE NANOPARTICLES; PLASMA SYNTHESIS; POROUS THIN FILMS; POSITIVE BIAS VOLTAGES; UNIFORM PORE STRUCTURES;

AEROSOLS; AGGLOMERATION; FABRICATION; MORPHOLOGY; NANOPARTICLES; NANOSTRUCTURES; POROSITY; SYNTHESIS (CHEMICAL); THIN FILMS;

DEPOSITION;

EID: 84882765755     PISSN: 13858947     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.cej.2013.07.097     Document Type: Article

References (25)

1. Kusunoki Y., Miyazawa T., Kunimori K., Tomishige K. Highly active metal-acid bifunctional catalyst system for hydrogenolysis of glycerol under mild reaction conditions. Catal. Commun. 2005, 6:645-649.
2. 2 supports toward methanol oxidation. Appl. Catal., B 2009, 91:663-669.
3. 2 nanoparticles. Sens. Actuators, B 2006, 114:283-295.
4. Tiemann M. Porous Metal Oxides as Gas Sensors, Chemistry - A. Eur. J. 2007, 13:8376-8388.
5. Meng G., Song H., Dong Q., Peng D. Application of novel aerosol-assisted chemical vapor deposition techniques for SOFC thin films. Solid State Ionics 2004, 175:29-34.
6. Schlupp M.V.F., Prestat M., Martynczuk J., Rupp J.L.M., Bieberle-Hütter A., Gauckler L.J. Thin film growth of yttria stabilized zirconia by aerosol assisted chemical vapor deposition. J. Power Sources 2012, 202:47-55.
7. 2. Chem. Vap. Deposition 1998, 4:109-114.
8. Zhang Q., Dandeneau C.S., Zhou X., Cao G. ZnO Nanostructures for Dye-Sensitized Solar Cells. Adv. Mater. 2009, 21:4087-4108.
9. 2 films for dye sensitized solar cells. J. Mater. Chem. 2012, 22:14254-14261.
10. Elmøe T.D., Tricoli A., Grunwaldt J.-D. Characterization of highly porous nanoparticle deposits by permeance measurements. Powder Technol. 2011, 207:279-289.
11. 2 thin films by aerosol flame deposition process. Korean J. Chem. Eng. 2012, 29:54-58.
12. Nolan M.G., Pemble M.E., Sheel D.W., Yates H.M. One step process for chemical vapour deposition of titanium dioxide thin films incorporating controlled structure nanoparticles. Thin Solid Films 2006, 515:1956-1962.
13. 2 thin films with controlled porosity. Chem. Vap. Deposition 2004, 10:17-20.
14. Rouessac V., Ungureanu A., Bangarda S., Deratani A., Lo C.-H., Wei T.-C., Lee K.-R., Lai J.-Y. Fluorine-free superhydrophobic microstructured films grown by PECVD. Chem. Vap. Deposition 2011, 17:198-203.
15. Wu C.-Y., Chiang B.-S., Chang S., Liu D.-S. Determination of photocatalytic activity in amorphous and crystalline titanium oxide films prepared using plasma-enhanced chemical vapor deposition. Appl. Surf. Sci. 2011, 257:1893-1897.
16. Wu C.-Y., Hong S.-C., Hwang F.-T., Lai L.-W., Lin T.-W., Liu D.-S. Effect of nickel oxide seed layers on annealed-amorphous titanium oxide thin films prepared using plasma-enhanced chemical vapor deposition. Thin Solid Films 2011, 520:320-327.
17. Mädler L., Lall A.A., Friedlander S.K. One-step aerosol synthesis of nanoparticle agglomerate films: simulation of film porosity and thickness. Nanotechnology 2006, 17:4783.
18. Thimsen E., Biswas P. Nanostructured photoactive films synthesized by a flame aerosol reactor. AlChE J. 2007, 53:1727-1735.
19. Kulkarni P., Biswas P. A brownian dynamics simulation to predict morphology of nanoparticle deposits in the presence of interparticle interactions. Aerosol Sci. Technol. 2004, 38:541-554.
20. Hayashi Y., Shimada M., Okuyama K. Influence of synthesis conditions on the characteristics of nanoparticles produced in a nonequilibrium plasma field. J. Chem. Eng. Jpn. 2008, 41:62-68.
21. Fujimoto T., Okuyama K., Shimada M., Fujishige Y., Adachi M., Matsui I. Particle generation and thin film surface morphology in the tetraethylorthosilicate/oxygen plasma enhanced chemical vapor deposition process. J. Appl. Phys. 2000, 88:3047-3052.
22. Setyawan H., Shimada M., Hayashi Y., Okuyama K., Winardi S. Modeling of and experiments on dust particle levitation in the sheath of a radio frequency plasma reactor. J. Appl. Phys. 2005, 97:043306.
23. Hinds W.C. Aerosol Technology: Properties, Behavior, and Measurement of Airborne Particles 1982, John Wiley & Sons, New York.
24. Cooper D.W., Peters M.H., Miller R.J. Predicted deposition of submicrometer particles due to diffusion and electrostatics in viscous axisymmetric stagnation-point flow. Aerosol Sci. Technol. 1989, 11:133-143.
25. 3 - Cyanate ester hybrid films by resin infiltration. Curr. Appl. Phys. 2011, 11:S319-S323.