Fluorine-free superhydrophobic microstructured films grown by PECVD

Chemical Vapor Deposition

Volumn 17, Issue 7-9, 2011, Pages 198-203

  Rouessac, Vincent ^a   Ungureanu, Andreea ^a   Bangarda, Soumia ^a   Deratani, André ^a   Lo, Chia Hao ^a,b   Wei, Ta Chin ^b   Lee, Kueir Rarn ^b   Lai, Juin Yih ^b  

^a UNIVERSITÉ DE MONTPELLIER   (France)

^b CHUNG YUAN CHRISTIAN UNIVERSITY   (Taiwan)

Author keywords

Fluorine free material; One step process; PECVD; Superhydrophobic surface

Indexed keywords

CAPACITIVELY COUPLED PLASMA REACTORS; EXPERIMENTAL PARAMETERS; FLUORINE-FREE; GAS PRESSURES; HEXAMETHYL DISILOXANE; HYDROPHILIC MEMBRANES; LOW FREQUENCY; LOW PRESSURES; MACROPOROUS; ONE-STEP PROCESS; PLASMA DURATION; PULSED GLOW DISCHARGE; SINGLE-STEP; SUBSTRATE ROTATION; SUPER-HYDROPHOBIC SURFACES; SUPERHYDROPHOBIC; TRANSMEMBRANE PRESSURES; TRANSPARENT FILMS; VARIOUS SUBSTRATES; WATER CONTACT ANGLE;

CHEMICAL VAPOR DEPOSITION; CONTACT ANGLE; FLUORINE; GLOW DISCHARGES; PLASMA APPLICATIONS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

HYDROPHOBICITY;

EID: 80053207308     PISSN: 09481907     EISSN: 15213862     Source Type: Journal    
DOI: 10.1002/cvde.201106903     Document Type: Article

References (31)

1. A. Nakajima, K. Hashimoto, T. Watanabe, Monatshefte für Chemie 2001, 132, 31.
2. M. Liu, Y. Zheng, J. Zhai, L. Jiang, Accounts Chem. Res. 2010, 43, 368.
3. N. Zhao, J. Xu, Q. Xie, L. Weng, X. Guo, X. Zhang, L. Shi, Macromol. Rapid Commun. 2005, 26, 1075.
4. H. M. Shang, Y. Wang, S. J. Limmer, T. P. Chou, K. Takahashi, G. Z. Cao, Thin Solid Films 2005, 472, 37.
5. Y. Song, R. Premachandran Nair, M. Zou, Y. Wang, Nano Res. 2009, 2, 143.
6. X. Y. Ling, I. Y. Phang, G. J. Vancso, J. Huskens, D. N. Reinhoudt, Langmuir 2009, 25, 3260.
7. K. X. Yao, H. C. Zeng, Langmuir 2008, 24, 14234.
8. Y. Zhao, Q. Lu, D. Chen, Y. Wie, J. Mater. Chem. 2006, 16, 4504.
9. J. Pacifico, K. Endo, S. Morgan, P. Mulvaney, Langmuir 2006, 22, 11072.
10. Y. Li, C. Li, S. Oh Cho, G. Duan, W. Cai, Langmuir 2007, 23, 9802.
11. C. Gu, T.-Y. Zhang, Langmuir 2008, 24, 12010.
12. S. Li, H. Li, X. Wang, Y. Song, Y. Liu, L. Jiang, D. Zhu, J. Phys. Chem. B 2002, 106, 9274.
13. Z. Lin, Y. Liu, C.-P. Wong, Langmuir 2010, 26, 16110.
14. Y. Jiang, Z. Wang, X. Yu, F. Shi, H. Xu, X. Zhang, M. Smet, W. Dehaen, Langmuir 2005, 21, 1986.
15. S.-H. Gao, K.-S. Zhou, M.-K. Lei, L.-S. Wen, Plasma Process. Polym. 2009, 6, 530.
16. R. Di Mundo, V. De Benedictis, F. Palumbo, R. d'Agostino, Appl. Surf. Sci. 2009, 255, 5461.
17. Y. Zhou, X. Song, M. Yu, B. Wang, H. Yan, Surf. Rev. Lett. 2006, 13, 117.
18. A. D. Tserepi, M.-E. Vlachopoulou, E. Gogolides, Nanotechnology 2006, 17, 3977.
19. J. Fresnais, J.-P. Chapel, F. Poncin-Epaillard, Surf. Coat. Technol. 2006, 200, 5296.
20. B. Balu, V. Breedveld, D. W. Hess, Langmuir 2008, 24, 4785.
21. L.-M. Lacroix, M. Lejeune, L. Ceriotti, M. Kormunda, T. Meziani, P. Colpo, F. Rossi, Surf. Sci. 2005, 592, 182.
22. Y. Tang, X. Xu, J. Fang, Y. Liang, H.-F. Ji, IEEE Trans. Nanotechnology 2006, 5, 415.
23. A. Milella, R. Di Mundo, F. Palumbo, P. Favia, F. Fracassi, R. d'Agostino, Plasma Process. Polym. 2009, 6, 460.
24. K. Teshima, H. Sugimura, Y. Inoue, O. Takai, A. Takano, Chem. Vap. Deposition 2004, 10, 295.
25. W. Chen, A. Fadeev, M. Che Hsieh, D. Öner, J. Youngblood, T. McCarthy, Langmuir 1999, 15, 3395.
26. F. Palumbo, R. Di Mundo, D. Cappelluti, R. d'Agostino, Plasma Process. Polym, DOI: 10.1002/ppap.2010000098 (online).
27. C. Nwankire, G. Favaro, Q.-H. Duong, D. Dowling, Plasma Process. Polym, DOI: 10.1002/ppap.201000069 (online).
28. A. Cassie, S. Baxter, Trans. Faraday Soc. 1944, 40, 546.
29. M. Miyauchi, N. Kieda, S. Hishita, T. Mitsuhashi, A. Nakajima, T. Watanabe, K. Hashimoto, Surf. Sci. 2002, 511, 401.
30. C. G. L. Furmidge, J. Colloid Sci. 1962, 17, 309.
31. R. Di Mundo, F. Palumbo, Plasma Process. Polym. 2008, 8, 14.