Black Silicon nanostructures on silicon thin films prepared by reactive ion etching

Chinese Optics Letters

Volumn 11, Issue SUPPL.1, 2013, Pages

  Steglich, Martin ^a   Käsebier, Thomas ^a   Höger, Ingmar ^b   Füchsel, Kevin ^a   Tünnermann, Andreas ^a   Kley, Ernst Bernhard ^a  

^a FRIEDRICH SCHILLER UNIVERSITY JENA   (Germany)

^b LEIBNIZ INSTITUTE OF PHOTONIC TECHNOLOGY   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

BLACK SILICON; CRYSTALLINE SILICON THIN FILMS; ICP-RIE; SILICON THIN FILM;

INDUCTIVELY COUPLED PLASMA; NANOSTRUCTURES; REACTIVE ION ETCHING;

SILICON;

EID: 84881600394     PISSN: 16717694     EISSN: None     Source Type: Journal    
DOI: 10.3788/COL201311.S10502     Document Type: Article

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