Silicon carbide oxidation in high-pressure steam

Journal of the American Ceramic Society

Volumn 96, Issue 7, 2013, Pages 2330-2337

  Cheng, Ting ^a   Tortorelli, Peter F ^a  

^a OAK RIDGE NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS LAYER; CRYSTALLINE PHASE TRANSITION; DIFFUSION PROCESS; HIGH-PRESSURE STEAM; QUANTITATIVE KINETICS; SHORT-TERM EXPOSURE; STEAM PRESSURES; SURFACE LAYERS;

CRYSTALLINE MATERIALS; KINETICS; SILICATE MINERALS; SILICON CARBIDE;

STEAM;

EID: 84880292250     PISSN: 00027820     EISSN: 15512916     Source Type: Journal    
DOI: 10.1111/jace.12328     Document Type: Article

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