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Volumn 5, Issue 7, 2013, Pages 2945-2951

The extended growth of graphene oxide flakes using ethanol CVD

(7) Huang, Jingfeng a,b Larisika, Melanie c,d Fam, W H Derrick a He, Qiyuan a Nimmo, Myra A e Nowak, Christoph c,d Tok, I Y Alfred a,b

a NANYANG TECHNOLOGICAL UNIVERSITY (Singapore)

b NANYANG TECHNOLOGICAL UNIVERSITY (Singapore)

c AIT AUSTRIAN INSTITUTE OF TECHNOLOGY (Austria)

d NANYANG TECHNOLOGICAL UNIVERSITY (Singapore)

e LOUGHBOROUGH UNIVERSITY (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

AFM; CARRIER GAS; CHEMICAL VAPOR DEPOSITIONS (CVD); ELECTRICAL CONDUCTIVITY; ELECTRONIC DEVICE; GRAPHENE OXIDES; RELATIVE STANDARD DEVIATIONS;

ATMOSPHERIC PRESSURE; ETHANOL; GRAPHENE;

CHEMICAL VAPOR DEPOSITION;

EID: 84880126281 PISSN: 20403364 EISSN: 20403372 Source Type: Journal
DOI: 10.1039/c3nr33704a Document Type: Article

Times cited : (31)

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