The impact of negative oxygen ion bombardment on electronic and structural properties of magnetron sputtered ZnO:Al films

Applied Physics Letters

Volumn 102, Issue 24, 2013, Pages

  Bikowski, André ^a   Welzel, Thomas ^a   Ellmer, Klaus ^a  

^a HAHN MEITNER INSTITUT   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION TEMPERATURES; ELECTRONIC AND STRUCTURAL PROPERTIES; ELECTRONIC TRANSPORT PROPERTIES; EXCITATION FREQUENCY; INTERSTITIAL DEFECTS; NEGATIVE OXYGEN IONS; OXYGEN INTERSTITIALS; PLASMA EXCITATION FREQUENCIES;

ALUMINUM; ION BOMBARDMENT; MAGNETRONS; METALLIC FILMS; TRANSPORT PROPERTIES; ZINC OXIDE;

OXYGEN;

EID: 84879829641     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.4811647     Document Type: Article

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