Self-assembly and hierarchical patterning of aligned organic nanowire arrays by solvent evaporation on substrates with patterned wettability

ACS Applied Materials and Interfaces

Volumn 5, Issue 12, 2013, Pages 5757-5762

  Bao, Rong Rong ^a   Zhang, Cheng Yi ^a   Zhang, Xiu Juan ^b   Ou, Xue Mei ^a   Lee, Chun Sing ^c   Jie, Jian Sheng ^b   Zhang, Xiao Hong ^a  

^a TECHNICAL INSTITUTE OF PHYSICS AND CHEMISTRY   (China)

^b SOOCHOW UNIVERSITY   (China)

^c CITY UNIVERSITY OF HONG KONG   (Hong Kong)

Author keywords

controlled growth; nanodevice; nanopattern; optoelectronic; organic semiconductor; surface wettability

Indexed keywords

CONTROLLED GROWTH; NANO DEVICE; NANO PATTERN; OPTOELECTRONIC; SURFACE WETTABILITY;

ALIGNMENT; EVAPORATION; NANOWIRES; OPTOELECTRONIC DEVICES; PHASE TRANSITIONS; SEMICONDUCTING ORGANIC COMPOUNDS; SUBSTRATES; WETTING;

PROCESS CONTROL;

2,4 BIS(4 (N,N DIISOBUTYLAMINO) 2,6 DIHYDROXYPHENYL)SQUARAINE; 2,4-BIS(4-(N,N-DIISOBUTYLAMINO)-2,6-DIHYDROXYPHENYL)SQUARAINE; AMINOPHENOL DERIVATIVE; CYCLOBUTANE DERIVATIVE; DICHLOROMETHANE; NANOWIRE; SILICON DIOXIDE; SOLVENT;

ARTICLE; CHEMISTRY; MATERIALS TESTING; METHODOLOGY; NANOTECHNOLOGY; SEMICONDUCTOR; VOLATILIZATION; WETTABILITY;

AMINOPHENOLS; CYCLOBUTANES; MATERIALS TESTING; METHYLENE CHLORIDE; NANOTECHNOLOGY; NANOWIRES; SEMICONDUCTORS; SILICON DIOXIDE; SOLVENTS; VOLATILIZATION; WETTABILITY;

EID: 84879530900     PISSN: 19448244     EISSN: 19448252     Source Type: Journal    
DOI: 10.1021/am4012885     Document Type: Article

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