Monolayer resist for patterned contact printing of aligned nanowire arrays

Journal of the American Chemical Society

Volumn 131, Issue 6, 2009, Pages 2102-2103

  Takahashi, Toshitake ^a,b   Takei, Kuniharu ^a,b   Ho, Johnny C ^a,b   Chueh, Yu Lun ^a,b   Fan, Zhiyong ^a,b   Javey, Ali ^a,b  

^a UNIVERSITY OF CALIFORNIA   (United States)

^b LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL INTERACTIONS; CONTACT PRINTING; LIGHT PATTERNS; MOLECULAR MONOLAYER; NANO SCALE; NANOWIRE ARRAYS; OXYGEN-RICH ENVIRONMENT; RESIST LAYERS; SINGLE-STEP PROCESS;

ELECTRIC WIRE; NANOWIRES; OXYGEN; PRINTING; SELF ASSEMBLED MONOLAYERS;

ELECTRON ENERGY LEVELS;

GERMANIUM; NANOWIRE; SELF ASSEMBLED MONOLAYER; SILICON DIOXIDE;

ARTICLE; CHEMICAL BOND; CHEMICAL INTERACTION; CHEMICAL MODIFICATION; CHEMICAL REACTION; CONTACT ANGLE; ELLIPSOMETRY; NANOARRAY; NANOFABRICATION; SCANNING ELECTRON MICROSCOPY; TECHNIQUE; ULTRAVIOLET RADIATION;

EID: 67749089297     PISSN: 00027863     EISSN: None     Source Type: Journal    
DOI: 10.1021/ja8099954     Document Type: Article

References (14)

1. Xiang, J.; Lu, W.; Hu, Y.; Wu, Y.; Yan, H.; Lieber, C. M. Nature 2006, 441.
2. (a) Huang, M. H.; Mao, S.; Feick, H.; Yan, H. Q.; Wu, Y. Y.; Kind, H.; Weber, E.; Russo, R.; Yang, P. D. Science 2001, 292, 1897.
3. (b) Park, H. G.; Barrelet, C. J.; Wu, Y.; Tian, B.; Qian, F.; Lieber, C. M. Nat. Phot. 2008, 2, 622.
4. (a) Patolsky, F.; Zheng, G.; Lieber, C. M. Anal. Chem. 2006, 78, 4260.
5. (b) McAlpine, M. C.; Ahmad, H.; Wang, D.; Heath, J. R. Nat. Mater. 2007, 6, 379.
6. (a) Wang, X. D.; Song, J. H.; Liu, J.; Wang, Z. L. Science 2007, 316, 102.
7. (b) Law, M.; Greene, L. E.; Johnson, J. C.; Saykally, R.; Yang, P. D. Nat. Mater. 2005, 4, 455.
8. (a) Yu, G.; Cao, A.; Lieber, C. M. Nat. Nanotechnol. 2007, 2, 372.
9. (b)Pauzauskie, P.; Radenovic, A.; Trepagnier, E.; Shroff, H.; Yang, P. D.; Liphardt, J. Nat. Mater. 2006, 5, 97.
10. (a) Fan, Z.; Ho, J. C.; Jacobson, Z. A.; Yerushalmi, R.; Alley, R. L.; Razavi, H.; Javey, A. Nano Lett. 2008, 8, 25.
11. (b) Yerushalmi, R.; Jacobson, Z. A.; Ho, J. C.; Fan, Z.; Javey, A. Appl. Phys. Lett. 2007, 91, 203104.
12. Fan, Z.; Ho, J. C.; Jacobson, Z. A.; Razavi, H.; Javey, A. Proc. Natl. Acad. Sci. U.S.A. 2008, 105, 11066.
13. (a) Brandow, S. L.; Chen, M. S.; Aggarwal, R.; Dulcey, C. S.; Calvert, J. M.; Dressick, W. J. Langmuir 1999, 15, 5429.
14. (b) Kim, Y. J.; Lee, K. H.; Sano, H.; Han, J.; Ichii, T.; Murase, K.; Sugimura, H. Jpn. J. Appl. Phys. 2008, 47, 307.