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Volumn 22, Issue 3, 2013, Pages

Hydrazine generation for the reduction process using small-scale plasmas in an argon/ammonia mixed gas flow

Author keywords

[No Author keywords available]

Indexed keywords

AG PARTICLES; DRY PROCESS; MIXED GAS; REDUCTION PROCESS; SILVERS (I); SPECTROSCOPIC MONITORING; SURFACE REDUCTION; WATER SOLVENTS;

EID: 84878862826     PISSN: 09630252     EISSN: 13616595     Source Type: Journal    
DOI: 10.1088/0963-0252/22/3/032003     Document Type: Article
Times cited : (10)

References (31)
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    • Fridman A 2008 Plasma Chemistry (New York: Cambridge University Press)
    • (2008) Plasma Chemistry
    • Fridman, A.1
  • 8
    • 0037285214 scopus 로고    scopus 로고
    • Dielectric-Barrier Discharges: Their History, Discharge Physics, and Industrial Applications
    • DOI 10.1023/A:1022470901385
    • Kogelschatz U 2003 Plasma Chem. Plasma Process. 23 1 (Pubitemid 36257393)
    • (2003) Plasma chemistry and plasma processing , vol.23 , Issue.1 , pp. 1-46
    • Kogelschatz, U.1
  • 17
    • 13844298380 scopus 로고    scopus 로고
    • Integrated coaxial-hollow micro dielectric-barrier-discharges for a large-area plasma source operating at around atmospheric pressure
    • DOI 10.1088/0022-3727/38/3/012
    • Sakai O, Kishimoto Y and Tachibana K 2005 J. Phys. D: Appl. Phys. 38 431 (Pubitemid 40253336)
    • (2005) Journal of Physics D: Applied Physics , vol.38 , Issue.3 , pp. 431-441
    • Sakai, O.1    Kishimoto, Y.2    Tachibana, K.3
  • 23
    • 24644481410 scopus 로고    scopus 로고
    • Production of ammonia-derived radicals in a dielectric barrier discharge and their injection for denitrification
    • DOI 10.1016/j.surfcoat.2005.01.022, PII S0257897205000800
    • Kusano Y, Leipold F, Fateev A, Stenum B and Bindslev H 2005 Surf. Coat. Technol. 200 846 (Pubitemid 41269026)
    • (2005) Surface and Coatings Technology , vol.200 , Issue.1-4 SPEC. ISS. , pp. 846-849
    • Kusano, Y.1    Leipold, F.2    Fateev, A.3    Stenum, B.4    Bindslev, H.5


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.