The reduction of copper oxide thin films with hydrogen plasma generated by an atmospheric-pressure glow discharge

Journal of Physics D: Applied Physics

Volumn 29, Issue 10, 1996, Pages 2539-2544

  Sawada, Yasushi ^a   Tamaru, Hiroshi ^a   Kogoma, Masuhiro ^b   Kawase, Motoaki ^c   Hashimoto, Kenji ^c  

^a PANASONIC CORPORATION   (Japan)

^b SOPHIA UNIVERSITY   (Japan)

^c KYOTO UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

COPPER OXIDES; CRYSTAL LATTICES; DIFFUSION; FILM PREPARATION; GLOW DISCHARGES; HEATING; INTERFACES (MATERIALS); REDUCTION; SPUTTERING; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY;

ATMOSPHERIC PRESSURE GLOW DISCHARGE; ATOMIC HYDROGEN; COPPER OXIDE THIN FILMS; HYDROGEN PLASMA TREATMENT;

METALLIC FILMS;

EID: 0030257674     PISSN: 00223727     EISSN: None     Source Type: Journal    
DOI: 10.1088/0022-3727/29/10/003     Document Type: Article

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