Atomic layer deposition of high performance ultrathin TiO2 blocking layers for dye-sensitized solar cells

ChemSusChem

Volumn 6, Issue 6, 2013, Pages 1014-1020

  Kim, Do Han ^a   Woodroof, Mariah ^b   Lee, Kyoungmi ^a   Parsons, Gregory N ^a  

^a North Carolina State University   (United States)

^b University of Delaware   (United States)

Author keywords

atomic layer deposition; blocking; dye sensitized solar cells; electrochemistry; titanium

Indexed keywords

BLOCKING; CHARGE RECOMBINATIONS; DEPOSITION TECHNIQUE; DYE-SENSITIZED SOLAR CELL; DYE-SENSITIZED SOLAR CELLS; LOW LIGHT CONDITIONS; PHOTOGENERATED CHARGE RECOMBINATION; TRANSPARENT CONDUCTIVE OXIDES;

DEPOSITION; ELECTROCHEMISTRY; FILMS; OPEN CIRCUIT VOLTAGE; OPTIMIZATION; PHOTOELECTROCHEMICAL CELLS; SEMICONDUCTOR DEVICES; SOLAR CELLS; TITANIUM; TITANIUM DIOXIDE;

ATOMIC LAYER DEPOSITION;

COLORING AGENT; FLUORINE; GLASS; TIN DERIVATIVE; TIN DIOXIDE; TITANIUM; TITANIUM DIOXIDE; STANNIC OXIDE;

ARTICLE; CHEMISTRY; ELECTRIC CONDUCTIVITY; POWER SUPPLY; SOLAR ENERGY; SURFACE PROPERTY;

COLORING AGENTS; ELECTRIC CONDUCTIVITY; ELECTRIC POWER SUPPLIES; FLUORINE; GLASS; SOLAR ENERGY; SURFACE PROPERTIES; TIN COMPOUNDS; TITANIUM;

EID: 84878542175     PISSN: 18645631     EISSN: 1864564X     Source Type: Journal    
DOI: 10.1002/cssc.201300067     Document Type: Article

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