50 keV electron multibeam mask writer for the 11nm HP node: First results of the proof of concept tool (eMET POC)

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 8323, Issue , 2012, Pages

  Klein, Christof ^a   Loeschner, Hans ^a   Platzgummer, Elmar ^a  

^a IMS NANOFABRICATION AG   (Austria)

Author keywords

electron beam projection optics; electron multi beam technology; mask writer; multi beam; template writer

Indexed keywords

PHOTOMASKS; TECHNOLOGY;

ELECTRON-BEAM PROJECTION; EXPOSURE TOOL; HALF PITCHES; HIGH VOLUME MANUFACTURING; MASK WRITER; MULTI-BEAM; PROOF OF CONCEPT; TEMPLATE WRITER;

TOOLS;

EID: 84878419902     PISSN: 0277786X     EISSN: 1996756X     Source Type: Conference Proceeding    
DOI: 10.1117/12.916613     Document Type: Conference Paper

References (6)

1. Sang Hee Lee, Jin Choi, Seon Jun Min, Hee Bom Kim, Byung Gook Kim, Sang-Gyun Woo, and Han-Ku Cho, "Mask writing time explosion and its effect on CD control in e-beam lithography", Proc. SPIE 7748, 77480J (2010).
2. Lloyd C. Litt, "Multiple beam mask writers: an industry solution to the write time crisis", Proc. SPIE 7823, 78230A (2010).
3. Y. David Chan, "Mask Industry Assessment: 2011", Proc. SPIE 8166, 81660D (2011).
4. Elmar Platzgummer, "Maskless Lithography and Nanopatterning with Electron and Ion Multi-Beam Projection", Proc. SPIE 7637, 763703 (2010).
5. Elmar Platzgummer, Stefan Cernusca, Christof Klein, Jan Klikovits, Samuel Kvasnica, and Hans Loeschner, "eMET: 50keV electron Mask Exposure Tool development based on proven multi-beam projection technology", Proc. SPIE 7823, 782308 (2010).
6. Elmar Platzgummer, Christof Klein, and Hans Loeschner, "eMET POC: Realization of a proof-of-concept 50 keV electron multibeam Mask Exposure Tool", Proc. SPIE 8166, 816622 (2011).