Block-copolymer healing of simple defects in a chemoepitaxial template

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 8680, Issue , 2013, Pages

  Patrone, Paul N ^a,b,c,d   Gallatin, Gregg M ^a,e  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

^b University of Maryland   (United States)

^c University of Maryland   (United States)

^d UNIVERSITY OF MARYLAND   (United States)

^e Applied Math Solutions   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

LENGTH SCALE; MASS CONSERVATION; MICRODOMAIN INTERFACES; MONOMER DENSITY; OSCILLATIONS DECAYS; PARALLEL LINE; PHASE-FIELD MODELS; TEMPLATED SUBSTRATES;

BLOCK COPOLYMERS;

INTERFACES (MATERIALS);

EID: 84878393280     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.2011656     Document Type: Conference Paper

References (16)

1. R. Ruiz, H. Kang, F. A. Detcheverry, E. Dobisz, D. S. Kercher, T. R. Albrecht, J. J. de Pablo, and P. F. Nealey, "Density multiplication and improved lithography by directed block copolymer assembly," Science, vol. 321, no. 5891, pp. 936-939, 2008.
2. F. A. Detcheverry, G. Liu, P. F. Nealey, and J. J. de Pablo, "Interpolation in the directed assembly of block copolymers on nanopatterned substrates: Simulation and experiments," Macromolecules, vol. 43, no. 7, pp. 3446-3454, 2010.
3. P. A. Rincon Delgadillo, R. Gronheid, C. J. Thode, H.Wu, Y. Cao, M. Somervell, K. Nafus, and P. F. Nealey, "All track directed self-assembly of block copolymers: process flow and origin of defects," pp. 83230D-83230D-9, 2012.
4. J. Y. Cheng, C. T. Rettner, D. P. Sanders, H.-C. Kim, and W. D. Hinsberg, "Dense self-assembly on sparse chemical patterns: Rectifying and multiplying lithographic patterns using block copolymers," Advanced Materials, vol. 20, no. 16, pp. 3155-3158, 2008.
5. K. C. Daoulas, M. Muller, M. P. Stoykovich, H. Kang, J. J. de Pablo, and P. F. Nealey, "Directed copolymer assembly on chemical substrate patterns: A phenomenological and single-chain-in-mean-field simulations study of the inuence of roughness in the substrate pattern," Langmuir, vol. 24, no. 4, pp. 1284-1295, 2008. PMID: 18067336.
6. G. M. Perera, C. Wang, M. Doxastakis, R. J. Kline, W. li Wu, A. W. Bosse, and G. E. Stein, "Directed self-assembly of lamellar copolymers: Effects of interfacial interactions on domain shape," ACS Macro Letters, vol. 1, no. 11, pp. 1244-1248, 2012.
7. P. N. Patrone and G. M. Gallatin, "Modeling line edge roughness in templated, lamellar block copolymer systems," Macromolecules, vol. 45, no. 23, pp. 9507-9516, 2012.
8. T. Ohta and K. Kawasaki, "Equilibrium morphology of block copolymer melts," Macromolecules, vol. 19, no. 10, pp. 2621-2632, 1986.
9. L. Leibler, "Theory of microphase separation in block copolymers," Macromolecules, vol. 13, no. 6, pp. 1602-1617, 1980.
10. C. Forrey, K. G. Yager, and S. P. Broadaway, "Molecular dynamics study of the role of the free surface on block copolymer thin film morphology and alignment," ACS Nano, vol. 5, no. 4, pp. 2895-2907, 2011.
11. Q. Wang, "Symmetric diblock copolymers in nanopores: Monte carlo simulations and strong-stretching theory," The Journal of Chemical Physics, vol. 126, no. 2, p. 024903, 2007.
12. Q. Wang, S. K. Nath, M. D. Graham, P. F. Nealey, and J. J. de Pablo, "Symmetric diblock copolymer thin films confined between homogeneous and patterned surfaces: Simulations and theory," The Journal of Chemical Physics, vol. 112, no. 22, pp. 9996-10010, 2000.
13. G. H. Fredrickson, "Computational field theory of polymers: opportunities and challenges," Soft Matter, vol. 3, pp. 1329-1334, 2007.
14. A. W. Bosse, E. K. Lin, R. L. Jones, and A. Karim, "Interfacial uctuations in an ideal block copolymer resist," Soft Matter, vol. 5, pp. 4266-4271, 2009.
15. A. W. Bosse, "Phase-field simulation of long-wavelength line edge roughness in diblock copolymer resists," Macromolecular Theory and Simulations, vol. 19, no. 7, pp. 399-406, 2010.
16. Y. S. Jung, J. B. Chang, E. Verploegen, K. K. Berggren, and C. A. Ross, "A path to ultranarrow patterns using self-assembled lithography," Nano Letters, vol. 10, no. 3, pp. 1000-1005, 2010. PMID: 20146429.