Electrically pumped ultraviolet lasing from ZnO in metal-insulator-semi devices

Applied Physics A: Materials Science and Processing

Volumn 111, Issue 3, 2013, Pages 689-694

  Wu, Kewei ^a   Ding, Ping ^a   Lu, Yangfan ^a   Pan, Xinhua ^a   He, Haiping ^a   Huang, Jingyun ^a   Zhao, Binghui ^a   Chen, Cong ^a   Chen, Lingxiang ^a   Ye, Zhizhen ^a  

^a ZHEJIANG UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRICALLY PUMPED; ELECTROLUMINESCENCE SPECTRA; ELECTRON BEAM EVAPORATION; ELECTRON BLOCKING; HIGHER EMISSION INTENSITY; METAL-INSULATOR-SEMICONDUCTOR DIODES; PLASMA ASSISTED MOLECULAR BEAM EPITAXY; ULTRAVIOLET LASING;

ELECTRON BEAMS; METAL INSULATOR BOUNDARIES; METALLIC FILMS; MIS DEVICES; PHOTOELECTRONS; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY; ZINC OXIDE;

AMORPHOUS SILICON;

EID: 84878114062     PISSN: 09478396     EISSN: 14320630     Source Type: Journal    
DOI: 10.1007/s00339-013-7710-7     Document Type: Article

References (32)

1. D.S. Wiersma, Nat. Phys. 4, 359 (2008)
2. N.M. Lawandy, R.M. Balachandran, A.S. Gome, E. Sauvain, Nature 368, 436 (1994)
3. H. Cao, Y.G. Zhao, H.C. Ong, S.T. Ho, J.Y. Dai, J.Y. Wu, R.P.H. Chang, Appl. Phys. Lett. 73, 3656 (1998)
4. T. Nakamura, T. Takahashi, S. Adachi, Phys. Rev. B 81, 125324 (2010)
5. A. Tulek, R.C. Polson, Z.V. Vardeny, Nat. Phys. 6, 303 (2010)
6. A. Kikuchi, K. Yamano, M. Tada, K. Kishino, Phys. Status Solidi B 241, 2754 (2004)
7. C.S. Wang, Y.L. Chen, H.Y. Lin, Y.T. Chen, Y.F. Chen, Appl. Phys. Lett. 97, 191104 (2010)
8. X.Y. Ma, P.L. Chen, D.S. Li, Y.Y. Zhang, D.R. Yang, Appl. Phys. Lett. 91, 251109 (2007)
9. H.K. Liang, S.F. Yu, H.Y. Yang, Appl. Phys. Lett. 96, 101116 (2010)
10. X.Y. Liu, C.X. Shan, S.P. Wang, Z.Z. Zhang, D.Z. Shen, Nanoscale 4, 2843 (2012)
11. V.M. Apalkov, M.E. Raikh, B. Shapiro, Phys. Rev. Lett. 89, 016802 (2002)
12. Y.P. Li, X.Y. Ma, M.S. Xu, L.L. Xiang, D.R. Yang, Opt. Express 9, 8662 (2011)
13. H. Zhu, C.X. Shan, B. Yao, B.H. Li, J.Y. Zhang, Z.Z. Zhang, D.X. Zhao, D.Z. Shen, X.W. Fan, Y.M. Lu, Z.K. Tang, Adv. Mater. 21, 1613 (2009)
14. C.Y. Liu, H.Y. Xu, J.G. Ma, X.H. Li, X.T. Zhang, Y.C. Liu, R. Mu, Appl. Phys. Lett. 99, 063115 (2011)
15. E.S.P. Leong, S.F. Yu, Adv. Mater. 18, 1685 (2006)
16. X.H. Pan, P. Ding, H.P. He, J.Y. Huang, B. Lu, H.H. Zhang, Z.Z. Ye, Opt. Commun. 285, 21 (2012)
17. NIST X-Ray Photoelectron Spectroscopy Database, Version 4.1 (National Institute of Standards and Technology, Gaithersburg, 2012). http://srdata.nist. gov/xps/. Accessed 20 January 2013
18. J.P. Richters, T. Voss, D.S. Kim, R. Scholz, M. Zacharias, Nanotechnology 19, 305202 (2008)
19. L. Skuja, J. Non-Cryst. Solids 239, 16 (1998)
20. H. Wong, Microelectron. Reliab. 42, 317 (2002)
21. X.S. Peng, L.D. Zhang, G.W. Meng, X.F. Wang, Y.W. Wang, C.Z. Wang, G.S. Wu, J. Phys. Chem. B 106, 11163 (2002)
22. H.B. Liu, H.P. He, S.L. Li, K.W. Wu, J.Y. Huang, Y.F. Lu, X.H. Pan, Z.Z. Ye, Appl. Phys. Express 5, 112102 (2012)
23. H.B. Zeng, G.T. Duan, Y. Li, S.K. Yang, X.X. Xu, W.P. Cai, Adv. Funct. Mater. 20, 561 (2010)
24. S. Chu, M. Olmedo, Z. Yang, J.Y. Kong, J.L. Liu, Appl. Phys. Lett. 93, 181106 (2008)
25. S. Chu, J.Z. Zhao, Z. Zuo, J.Y. Kong, L. Li, J.L. Liu, J. Appl. Phys. 109, 123110 (2012)
26. R.C. Polson, Z.V. Vardeny, Appl. Phys. Lett. 85, 1289 (2004)
27. Y.J. Chen, J. Herrnsdrof, B. Guilhabert, Y.F. Zhang, I.M. Watson, E. Gu, N. Laurand, M.D. Dawson, Opt. Express 19, 2996 (2011)
28. H.Y. Yang, S.P. Lau, S.F. Yu, A.P. Abiyasa, M. Tanemura, T. Okita, H. Hatano, Appl. Phys. Lett. 89, 011103 (2006)
29. Y. Ling, H. Cao, A.L. Burin, M.A. Ratner, X. Liu, R.P.H. Chang, Phys. Rev. A 64, 063808 (2001)
30. H.Y. Yang, S.F. Yu, J. Yan, L.D. Zhang, Nanoscale Res. Lett. 5, 809 (2010)
31. H. Bartzsch, D. Glöß, P. Frach, M. Gittner, E. Schultheiß, W. Brode, J. Hartung, Phys. Status Solidi A 206, 514 (2009)
32. L.I. Berger, in CRC Handbook of Chemistry and Physics, ed. by M. Haynes, 93rd edn. (Taylor and Francis Group, Boca Raton, 2012), p. 1545