Pulsed and potentiostatic electrodeposition of CuInSe2 on gold-coated alumina substrates

Journal of Applied Electrochemistry

Volumn 43, Issue 6, 2013, Pages 619-628

  Valdes M ^a   Mollar, M ^b   Vazquez M ^a   Mari B ^b  

^a UNIVERSIDAD NACIONAL DE MAR DEL PLATA   (Argentina)

^b UNIVERSITAT POLITÈCNICA DE VALÈNCIA   (Spain)

Author keywords

AFM; CuInSe2; Electrodeposition; Semiconductor; Thin films

Indexed keywords

AFM; ATOMIC FORCE MICROSCOPE (AFM); CUINSE2; ELECTROCHEMICAL MEASUREMENTS; ELECTRODEPOSITED FILMS; GRAZING INCIDENCE X-RAY DIFFRACTION; HOMOGENEOUS MORPHOLOGY; POTENTIOSTATIC ELECTRODEPOSITION;

ALUMINA; ATOMIC FORCE MICROSCOPY; DEPOSITS; ELECTRODEPOSITION; ENERGY DISPERSIVE SPECTROSCOPY; GOLD; GOLD COATINGS; RAMAN SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTING SELENIUM COMPOUNDS; SEMICONDUCTOR MATERIALS; STOICHIOMETRY; THIN FILMS; VAPOR DEPOSITION; VAPORS; X RAY DIFFRACTION;

COPPER;

EID: 84878010659     PISSN: 0021891X     EISSN: None     Source Type: Journal    
DOI: 10.1007/s10800-013-0549-y     Document Type: Article

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