Formation of Cu/Pd bimetallic crystals by electrochemical deposition

Electrochimica Acta

Volumn 55, Issue 11, 2010, Pages 3714-3720

  Alvarez, A E ^a   Salinas, D R ^a  

^a UNIVERSIDAD NACIONAL DEL SUR   (Argentina)

Author keywords

AFM; Bimetallic crystals; Cu Pd; Electrodeposition; Palladium

Indexed keywords

3-D GROWTH; ACID SOLUTIONS; ACTIVE SITE; AFM; AFM IMAGE; ANODIC STRIPPING; BIMETALLIC CRYSTALS; CORE SHELL STRUCTURE; CU/PD; DIFFERENT SIZES; ELECTROCHEMICAL DEPOSITION; ELECTROCHEMICAL TECHNIQUES; IN-SITU; MODIFIED SURFACES; MORPHOLOGICAL CHARACTERISTIC; NUCLEATION RATE; PALLADIUM ELECTRODEPOSITION; PARTIAL DISSOLUTION; POTENTIAL RANGE; POTENTIOSTATIC CURRENT TRANSIENTS; PROGRESSIVE NUCLEATION; RANDOMLY DISTRIBUTED; SEM; SEM/EDX; THEORETICAL MODELS; VITREOUS CARBON;

ATOMIC FORCE MICROSCOPY; COPPER DEPOSITS; CRYSTAL STRUCTURE; CRYSTALS; DISSOLUTION; ELECTROCHEMICAL ELECTRODES; ELECTRODEPOSITION; GLASSY CARBON; NUCLEATION; PALLADIUM; RATE CONSTANTS; REDUCTION; SCANNING ELECTRON MICROSCOPY; STRIPPING (DYES);

THREE DIMENSIONAL;

EID: 77949489405     PISSN: 00134686     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.electacta.2010.01.076     Document Type: Article

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