Growth and interface reactivity of titanium oxide thin films on Fe(001)

Journal of Physical Chemistry C

Volumn 117, Issue 18, 2013, Pages 9229-9236

  Brambilla, A ^a   Calloni, A ^a   Berti, G ^a   Bussetti, G ^a   Duo L ^a   Ciccacci, F ^a  

^a POLITECNICO DI MILANO   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRONIC AND STRUCTURAL PROPERTIES; INTERFACE REACTIVITY; INTERFACIAL MIXING; REACTIVE DEPOSITION; ROOM TEMPERATURE; TITANIUM OXIDE THIN FILMS; TITANIUM OXIDE TIO; X RAY PHOTOEMISSION SPECTROSCOPY;

DEPOSITION; ELECTRONS; LOW ENERGY ELECTRON DIFFRACTION; PHOTOELECTRON SPECTROSCOPY; THIN FILMS; TITANIUM; VAPOR DEPOSITION;

TITANIUM DIOXIDE;

EID: 84877714445     PISSN: 19327447     EISSN: 19327455     Source Type: Journal    
DOI: 10.1021/jp400159j     Document Type: Article

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