Mechanisms of plasmon-enhanced femtosecond laser nanoablation of silicon

Optics Express

Volumn 21, Issue 8, 2013, Pages 9703-9710

  Robitaille, Alexandre ^a   Boulais, Etienne ^a   Meunier, Michel ^a  

^a ÉCOLE POLYTECHNIQUE DE MONTRÉAL   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

ABLATION; DEPOSITS; NANORODS; SILICON; ULTRASHORT PULSES;

CARRIER DIFFUSIONS; CHARACTERISTIC SHAPES; DEPOSITED ENERGY; DIFFUSION-BASED MODEL; ELECTRON HOLE PAIRS; FIELD DISTRIBUTION; PLASMONIC EFFECTS; SUB-DIFFRACTION LIMIT;

PLASMONS;

GOLD; NANOTUBE; SILICON;

ARTICLE; CHEMICAL MODEL; CHEMISTRY; COMPUTER SIMULATION; METHODOLOGY; RADIATION EXPOSURE; SURFACE PLASMON RESONANCE; SURFACE PROPERTY;

COMPUTER SIMULATION; GOLD; MODELS, CHEMICAL; NANOTUBES; SILICON; SURFACE PLASMON RESONANCE; SURFACE PROPERTIES;

EID: 84877157632     PISSN: None     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OE.21.009703     Document Type: Article

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