Conditions for the growth of smooth La0.7Sr 0.3MnO3 thin films by pulsed electron ablation

Thin Solid Films

Volumn 534, Issue , 2013, Pages 83-89

  Graziosi, P ^a,b   Prezioso, M ^b   Gambardella, A ^b   Kitts, C ^b,e   Rakshit, R K ^b,f   Riminucci, A ^b   Bergenti, I ^b   Borgatti, F ^b   Pernechele, C ^c   Solzi, M ^c   Pullini, D ^d   Busquets Mataix, D ^a   Dediu, V A ^b  

^a UNIVERSITAT POLITÈCNICA DE VALÈNCIA   (Spain)

^b CNR   (Italy)

^c UNIVERSITY OF PARMA   (Italy)

^d CENTRO RICERCHE FIAT   (Italy)

^e CHALMERS UNIVERSITY OF TECHNOLOGY   (Sweden)

^f NATIONAL PHYSICAL LABORATORY   (India)

Author keywords

Atomically flat; Channel spark; Lanthanum strontium manganite; Magnetoresistance; Manganese perovskite; Pulsed electron beam deposition; Thin film

Indexed keywords

ATOMICALLY FLAT; CHANNEL-SPARK; LANTHANUM STRONTIUM MANGANITE; MANGANESE PEROVSKITES; PULSED-ELECTRON-BEAM DEPOSITIONS;

ABLATION; DEPOSITION; ELECTRIC SPARKS; ELECTRON BEAMS; ELECTRON SOURCES; MAGNETORESISTANCE; MANGANESE OXIDE; MANGANITES; OPTIMIZATION; PULSED LASER DEPOSITION; SURFACE ROUGHNESS; THIN FILMS;

VAPOR DEPOSITION;

EID: 84876665941     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2013.02.008     Document Type: Article

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