Pulsed electron beam deposition of oxide thin films

Journal of Physics D: Applied Physics

Volumn 41, Issue 16, 2008, Pages

  Nistor, M ^a   Mandache, N B ^a   Perriere J ^b  

^a NATIONAL INSTITUTE FOR LASER   (Romania)

^b INSTITUT DES NANOSCIENCES DE PARIS   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ALKALINE EARTH METALS; ARSENIC COMPOUNDS; BARIUM; BARIUM TITANATE; CANNING; CHEMICAL MODIFICATION; CHLORINE COMPOUNDS; DISCHARGE (FLUID MECHANICS); ELECTRON BEAMS; ELECTRON GUNS; ELECTRON OPTICS; ELECTRON SOURCES; ELECTRONS; GEOPHYSICAL PROSPECTING; OXIDES; PARTICLE BEAMS; PULSED LASER APPLICATIONS; PULSED LASER DEPOSITION; SOLIDS; STRONTIUM; STRONTIUM COMPOUNDS; SURFACE MORPHOLOGY; TARGETS; THICK FILMS; THICKNESS MEASUREMENT; THIN FILMS; TIN; TIN OXIDES; TITANIUM COMPOUNDS; ZINC; ZINC OXIDE; ZIRCONIA; ZIRCONIUM;

BARIUM STRONTIUM TITANATE; BEAM ENERGIES; BEAM PARAMETERS; COMPLEX OXIDES; DISCHARGE PARAMETERS; ELECTRON-BEAM; FAST IMAGING; FILM COMPOSITIONS; NANO-PARTICULATES; OXIDE THIN FILMS; PLASMA PLUMES; PULSED ELECTRON BEAMS; PULSED-ELECTRON-BEAM DEPOSITION; SIZE DROPLETS; SPARK DISCHARGES; ZIRCONIUM TIN TITANATE;

OXIDE FILMS;

EID: 49749103615     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/41/16/165205     Document Type: Article

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