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Volumn 13, Issue 3, 2013, Pages 2021-2024
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Nanosize-controlled titanium nitride films in pulsed dc magnetron sputtering
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Author keywords
Nano size control; Pulsed dc magnetron sputtering; Target frequency
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Indexed keywords
CROSS-SECTIONAL MICROSTRUCTURE;
FIELD EMISSION SCANNING ELECTRON MICROSCOPY;
GRAZING-INCIDENCE X-RAY DIFFRACTION;
HIGH-FREQUENCY PULSED PLASMA;
PULSED DC MAGNETRON SPUTTERING;
SIZE-CONTROL;
TARGET FREQUENCIES;
TITANIUM NITRIDE FILMS;
ATOMIC FORCE MICROSCOPY;
CRYSTAL MICROSTRUCTURE;
ELASTIC MODULI;
GRAIN SIZE AND SHAPE;
HARDNESS;
ION BOMBARDMENT;
MAGNETRON SPUTTERING;
METALLIC FILMS;
SURFACE ROUGHNESS;
TITANIUM NITRIDE;
X RAY DIFFRACTION;
FILM PREPARATION;
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EID: 84876260812
PISSN: 15334880
EISSN: 15334899
Source Type: Journal
DOI: 10.1166/jnn.2013.6970 Document Type: Article |
Times cited : (4)
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References (12)
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