Influence of annealing temperature on the properties of TiO2 films annealed by ex situ and in situ TEM

Journal Wuhan University of Technology, Materials Science Edition

Volumn 27, Issue 6, 2012, Pages 1014-1019

  Peng, Tangchao ^a,b   Xiao, Xiangheng ^a   Ren, Feng ^a   Xu, Jinxia ^a   Zhou, Xiaodong ^a   Mei, Fei ^c   Jiang, Changzhong ^a  

^a WUHAN UNIVERSITY   (China)

^b HUAZHONG UNIVERSITY OF SCIENCE AND TECHNOLOGY   (China)

^c HUBEI UNIVERSITY OF TECHNOLOGY   (China)

Author keywords

anatase; annealing; DC reactive magnetron sputtering; in situ TEM; TiO2 films

Indexed keywords

ANNEALING TEMPERATURES; ATOMIC FORCE MICROSCOPE (AFM); DC REACTIVE MAGNETRON SPUTTERING; EFFECT OF ANNEALING; IN-SITU OBSERVATIONS; IN-SITU TEM; TIO; TRANSMISSION ELECTRON MICROSCOPE;

ATOMIC FORCE MICROSCOPY; MAGNETRON SPUTTERING; OPTICAL PROPERTIES; QUARTZ; TITANIUM DIOXIDE; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION;

ANNEALING;

EID: 84875756469     PISSN: 10002413     EISSN: None     Source Type: Journal    
DOI: 10.1007/s11595-012-0591-3     Document Type: Article

References (31)

1. Fujishima A, Zhang X. Titanium Dioxide Photocatalysis: Present Situation and Future Approaches [J]. C. R. Chim., 2006, 9: 750-760
2. Fujishima A, Honda K. Electrochemical Photolysis of Water at a Semiconductor Electrode [J]. Nature, 1972, 238: 37-38
3. Matsunaga T, Tomada R, Nakajima T, Wake H. Photoelectrochemical Sterilization of Microbial Cells by Semiconductor Powders [J]. FEMS Microbiol. Lett., 1985, 29: 211-214
4. Zheng H, Pin-Ching M, Blake D M, Wolfrum J, Edward J. Bactericidal Mode of Titanium Dioxide Photocatalysis [J]. J. Photochem. Photobiol. A: Chem., 2000, 130: 163-170
5. Blake DM, Pin-Ching M, Zheng H, Jacoby EJ, Wolfrum J, Huang J. Application of the Photocatalytic Chemistry of Titanium Dioxide to Disinfection and the Killing of Cancer Cells [J]. Sep. Purif. Methods, 1999, 28: 1-50
6. 2 Thin Films[J]. J. Photochem. Photobiol. B: Biol. 2003, 70: 45-50
7. Wang R, Hashimoto K, Fujishima A, Chikuni M, Kojima E, Kitamura A, Shimohigoshi M, Watanabe T. Light-induced Amphiphilic Surfaces [J]. Nature, 1997, 388: 431-432
8. 2 Photocatalysis: A Historical Overview and Future Prospects[J]. Jpn. J. Appl. Phys., 2005, 44: 8 269-8 285
9. 2 Thin Films Deposited by Reactive Magnetron Sputtering [J]. Thin Solid Films, 2010, 518: 7 258-7 262
10. Pulker H K. Coatings on Glass [M]. Elsevier, Amsterdam, 1999
11. 2 Thin Films for Dielectric Applications [J]. Thin Solid Films, 2006, 515: 1 708-1 713
12. 2 Optical Coating Layers for Self-cleaning Applications [J]. Ceram. Int., 2008, 34: 1 067-1 071
13. 2 Heat Mirrors by Laser Ablation of Single TiN Target [J]. J. Phys.: Conf. Ser., 2008, 100: 012038
14. 2 Transparent Multi-layer Heat Shields[J]. J. Phys. D: Appl. Phys., 2007, 40: 2 445-2 451
15. 2 Thin Films on Glass Substrates [J]. Mater. Sci. Eng. B, 2007, 138: 139-143
16. 2 Films for Dye-sensitized Solar Cells Using Reactive RF Plasma[J]. Thin Solid Films, 2007, 515: 4 996-4 999
17. Habibi MH, Talebian N, Choi JH. The Effect of Annealing on Photocatalytic Properties of Nanostructured Titanium Dioxide Thin Films [J]. Dyes Pigm., 2007, 73: 103-110
18. 2 Film Deposited by Ion Beam Assisted Electron Beam Evaporation[J]. Appl. Surf. Sci., 2008, 254: 2 685-2 689
19. 2 Thin Film [J]. Mater. Lett., 2008, 62: 361-364
20. 2 Thin Films Prepared by Aqueous Sol-gel Process at Low Temperature [J]. Thin Solid Films, 2002, 405: 50-54
21. 2 Films Prepared by Chemical Vapor Deposition at Atmosphere Pressure [J]. J. Non-Cryst. Solids, 2008, 354: 1 440-1 443
22. Amor SB, Baud G, Jacquet M, Pichon N. Photoprotective Titania Coatings on PET Substrates[J]. Surf. Coat. Technol., 1998, 102: 63-72
23. 2 Thin Films[J]. Optical Materials, 2010, 32: 690-695
24. 2 Films [J]. J. Alloys Compd., 2001, 509: 4 060-4 064
25. 2 Thin Films Deposited by RF Magnetron Sputtering [J]. Vacuum, 2007, 81: 627-631
26. Hou YQ, Zhuang DM, Zhang G, Zhao M, Wu MS. Influence of Annealing Temperature on The Properties of Titanium Oxide Thin Film[J]. Appl. Surf. Sci., 2003, 218: 98-106
27. 2 Films Deposited by RF Mgnetron Sputtering[J]. Thin Solid Films, 2010, 518:6 904-6 908
28. 2 Thin Films Deposited by DC Magnetron Sputtering [J]. Thin Solid Films, 2006, 515: 425-429
29. 2 Thin Films[J]. Mater. Res. Bull., 2000, 35: 1 293-1 301
30. 2 Thin Films Prepared by RF Magnetron Sputtering Method [J]. Surf. Coat. Technol., 2002, 155: 141-145
31. 2 Thin Films Derived by Solgel Dip Coating Process [J]. J. Non-Cryst. Solids, 2007, 353: 2 469-24