Sputtered TiO 2 thin films with NiO additives for hydrogen detection

Applied Surface Science

Volumn 269, Issue , 2013, Pages 110-115

  Kosc, I ^a   Hotovy, I ^a   Rehacek, V ^a   Griesseler, R ^b   Predanocy, M ^a   Wilke, M ^b   Spiess, L ^b  

^a SLOVAK UNIVERSITY OF TECHNOLOGY   (Slovakia)

^b ILMENAU UNIVERSITY OF TECHNOLOGY   (Germany)

Author keywords

Gas; Hydrogen; NiO; Sensors; Sputtering

Indexed keywords

AMORPHOUS MATERIALS; DEPOSITION; GALLIUM; GLOW DISCHARGES; HYDROGEN; NICKEL OXIDE; OPTICAL EMISSION SPECTROSCOPY; RAPID THERMAL ANNEALING; SCANNING ELECTRON MICROSCOPY; SENSORS; SPUTTERING; TEMPERATURE DISTRIBUTION; TITANIUM DIOXIDE; X RAY DIFFRACTION;

ANNEALING TEMPERATURES; CRITICAL CONCENTRATION; ELECTRICAL MEASUREMENT; GLOW DISCHARGE OPTICAL EMISSION SPECTROMETRIES; LOW OPERATING TEMPERATURE; OPERATING TEMPERATURE; POST DEPOSITION TREATMENT; TEMPERATURE DEPENDENCE;

THIN FILMS;

EID: 84875457221     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2012.09.061     Document Type: Conference Paper

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